Ceramic high barrier film apparatus of continuous winding type magnetron sputtering manufacture

Abstract

The invention provides a ceramic high-resistance film device manufactured by a continuous coiling type magnetic-control sputtering method, which comprises a settling chamber, a unwinding device, a winding device, a radio frequency AC power source, and a butterfly valve, a mechanical pump, a lobe pump and a molecular pump which are arranged at the exterior of the settling chamber. In the middle of the settling chamber, a coating roller is installed, while at the lower part thereof, a rectangular silicon target is provided and at two ends thereof, end sockets are provided; at least one observation window is arranged on the settling chamber; and the lower part of the settling chamber is respectively connected with the mechanical pump, the lobe pump and the molecular pump via the butterfly valve and conduits. The ceramic high-barrier film device of the invention is characterized by continuous production, can better solve the problems of bell-typed or vertical-typed sedimentation device where the continuous production is unavailable, the production capacity is low and vacuum extraction needs to be conducted again for every time; and the utilization of the rectangular silicon target can fully utilize the space of the settling chamber and the large-scale industrialized production is convenient.

Description

(1) Technical field [0001] The invention relates to ceramic coating technology, in particular to a ceramic coating device by magnetron sputtering method. (2) Background technology [0002] At present, the equipment used for magnetron sputtering ceramic coating all over the world adopts a bell-type or vertical deposition device. The circular deposition chamber is stood on the support, and the upper and lower plates are also circular and smaller than the diameter of the bell. The disadvantage is that the bell jar type or vertical deposition device is limited by the flange sealing method and space utilization, so it cannot be made very large. If it is too large, it will be difficult to process and easy to deform. In addition, the larger the diameter, the smaller the proportion of practical space. The higher the cost of single-piece processing, the more difficult it is to seal the vacuum chamber. Every time a batch is produced, the vacuum is re-evacuated, and the preparation tim...

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Problems solved by technology

[0003] The purpose of the present invention is to provide a device that overcomes the shortcomings of the above-mentioned existing equipment, can be continuously produced, and can better solve the problems that the bell jar type or vertical deposition device cannot be continuously produced, the production capacity is low, and the vacuum must be re-evacuated every time. , the use of rectangular polar targets can make full use of the deposition chamber space, which is convenient for large-scale industrial production of ceramic high-resistance film devices manufactured by continuous winding magnetron sputtering

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