Method for reclaiming hydrogen from tail gas from polysilicon production
A polysilicon and hydrogen technology, applied in separation methods, chemical instruments and methods, hydrogen separation, etc., can solve problems such as underutilization, serious environmental pollution, backward technology, etc., to reduce the generation and quantity of pollutants, The effect of solving environmental pollution problems and saving project investment
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Embodiment 1
[0024] reference figure 1 , Which shows the flow chart of the industrial production of polysilicon that can apply the hydrogen recovery method according to the embodiment of the present invention. In the prior art, there are many methods for industrial polysilicon production. The polysilicon production process of the present invention is applied. Using industrial silicon and hydrogen chloride (HCl) as the main raw materials, by controlling the reaction conditions to generate trichlorosilane (SiHCl) 3 )-Based mixture of chlorosilane and hydrogen, and then through the existing purification technology to trichlorosilane (SiHCl 3 ) After purification, it is sent to the reduction furnace to make trichlorosilane (SiHCl 3 ) And auxiliary material hydrogen (H 2 ) Reaction and reduction to generate polysilicon.
[0025] In the above-mentioned industrial production of polysilicon, the exhaust gas produced mainly includes hydrogen (H 2 ), hydrogen chloride (HCl), and chlorosilane, the chlor...
Embodiment 2
[0038] Reference below image 3 The method for recovering hydrogen from the tail gas generated in the production of polysilicon according to the second embodiment of the present invention is described. image 3 Shows a flow chart according to the second embodiment of the present invention. The main difference between this embodiment and the above-mentioned first embodiment lies in that it also includes hydrogen chloride (HCl) and silicon tetrachloride (SiCl) adsorbed in the activated carbon. 4 ) Of the recycling process.
[0039] Specifically, first, hydrogen chloride (HCl) and chlorosilane ((here, the main component of the chlorosilane is silicon tetrachloride (SiCl)) adsorbed in the activated carbon 4 )) heating, heating to a temperature of about 80 ~ 180 ℃, so as to improve the movement activity of gas molecules, and then use, for example, high-purity hydrogen (H 2 ) The heated gaseous hydrogen chloride (HCl) and chlorosilane (here, the main component of the chlorosilane is sil...
Embodiment 3
[0041] Reference below Figure 4 The method for recovering hydrogen from the tail gas generated in the production of polysilicon according to the third embodiment of the present invention is described. reference Figure 4 The main difference between the third embodiment of the present invention and the above-mentioned first and second embodiments is that it also includes the use of liquid silicon tetrachloride (SiCl 4 ) The step of rinsing the exhaust gas.
[0042] In the traditional wet exhaust gas treatment process, the exhaust gas is usually rinsed with water. The purpose is to rinse the hydrogen chloride (HCl) in the exhaust gas into the water, and part of the unrecovered chlorosilane is hydrolyzed into the water after being rinsed. Hydrogen chloride and silica hydrate, this kind of sewage needs to be treated separately, which leads to high material consumption and serious environmental pollution, which restricts large-scale industrial production.
[0043] According to the embod...
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