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Method for reclaiming hydrogen from tail gas from polysilicon production

A polysilicon and hydrogen technology, applied in separation methods, chemical instruments and methods, hydrogen separation, etc., can solve problems such as underutilization, serious environmental pollution, backward technology, etc., to reduce the generation and quantity of pollutants, The effect of solving environmental pollution problems and saving project investment

Active Publication Date: 2008-12-24
CHINA ENFI ENGINEERING CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] my country's polysilicon industry started in the 1950s, realized industrialization in the mid-1960s, and developed blindly in the early 1970s. There were more than 20 production plants, all using traditional Siemens technology, backward technology, serious environmental pollution, and material consumption. Large, high production costs, most enterprises lose money and stop production or change production one after another
[0005] The outstanding feature of the traditional polysilicon production process is the tail gas wet recovery technology, that is, the tail gas in the reduction furnace is initially pressurized to separate chlorosilane and then washed with water to recover hydrogen. Due to the process of water washing, impurity gases such as oxygen and carbon dioxide in the water will be released. Contamination of hydrogen, so a large amount of recovered hydrogen needs to be purified again. During the leaching process, chlorosilane is hydrolyzed to produce sewage, which needs further treatment, resulting in environmental pollution and large material consumption.
At the same time, the hydrogen generated in the production has not been fully utilized, which not only wastes energy, but also causes environmental pollution

Method used

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  • Method for reclaiming hydrogen from tail gas from polysilicon production

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Embodiment 1

[0024] reference figure 1 , Which shows the flow chart of the industrial production of polysilicon that can apply the hydrogen recovery method according to the embodiment of the present invention. In the prior art, there are many methods for industrial polysilicon production. The polysilicon production process of the present invention is applied. Using industrial silicon and hydrogen chloride (HCl) as the main raw materials, by controlling the reaction conditions to generate trichlorosilane (SiHCl) 3 )-Based mixture of chlorosilane and hydrogen, and then through the existing purification technology to trichlorosilane (SiHCl 3 ) After purification, it is sent to the reduction furnace to make trichlorosilane (SiHCl 3 ) And auxiliary material hydrogen (H 2 ) Reaction and reduction to generate polysilicon.

[0025] In the above-mentioned industrial production of polysilicon, the exhaust gas produced mainly includes hydrogen (H 2 ), hydrogen chloride (HCl), and chlorosilane, the chlor...

Embodiment 2

[0038] Reference below image 3 The method for recovering hydrogen from the tail gas generated in the production of polysilicon according to the second embodiment of the present invention is described. image 3 Shows a flow chart according to the second embodiment of the present invention. The main difference between this embodiment and the above-mentioned first embodiment lies in that it also includes hydrogen chloride (HCl) and silicon tetrachloride (SiCl) adsorbed in the activated carbon. 4 ) Of the recycling process.

[0039] Specifically, first, hydrogen chloride (HCl) and chlorosilane ((here, the main component of the chlorosilane is silicon tetrachloride (SiCl)) adsorbed in the activated carbon 4 )) heating, heating to a temperature of about 80 ~ 180 ℃, so as to improve the movement activity of gas molecules, and then use, for example, high-purity hydrogen (H 2 ) The heated gaseous hydrogen chloride (HCl) and chlorosilane (here, the main component of the chlorosilane is sil...

Embodiment 3

[0041] Reference below Figure 4 The method for recovering hydrogen from the tail gas generated in the production of polysilicon according to the third embodiment of the present invention is described. reference Figure 4 The main difference between the third embodiment of the present invention and the above-mentioned first and second embodiments is that it also includes the use of liquid silicon tetrachloride (SiCl 4 ) The step of rinsing the exhaust gas.

[0042] In the traditional wet exhaust gas treatment process, the exhaust gas is usually rinsed with water. The purpose is to rinse the hydrogen chloride (HCl) in the exhaust gas into the water, and part of the unrecovered chlorosilane is hydrolyzed into the water after being rinsed. Hydrogen chloride and silica hydrate, this kind of sewage needs to be treated separately, which leads to high material consumption and serious environmental pollution, which restricts large-scale industrial production.

[0043] According to the embod...

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Abstract

The invention relates to a hydrogen recovery method in the exhaust generated by producing polysilicon. The exhaust mainly comprises hydrogen, chlorine hydride, dichlorosilane, trichlorosilane and tetrachlorosilane. The method comprises the following steps: pressurizing and cooling the exhaust in order to turn trichlorosilane and tetrachlorosilane to liquid state while hydrogen, chlorine hydride and dichlorosilane still being gas state, so that the gas hydrogen, chlorine hydride and dichlorosilane can be separated from the liquid trichlorosilane and tetrachlorosilane by gas liquid separation; dissolving the gas chlorine hydride and dichlorosilane into the liquid tetrachlorosilane by passing gas hydrogen, chlorine hydride and dichlorosilane through the liquid tetrachlorosilane, so that separating the hydrogen from chlorine hydride and dichlorosilane. The invention recovers the hydrogen in the exhaust by dry treatment and the hydrogen can be reused in the polysilicon production, which makes good use of the material, reduces pollutants, settles the problem of environmental pollution, improves the product quality and reduces the cost.

Description

Technical field [0001] The invention relates to a method for recovering and processing tail gas produced in the industrial production of polysilicon, and more specifically, to a method for recovering hydrogen from the tail gas produced in the production of polysilicon. Background technique [0002] Polycrystalline silicon is the raw material for the preparation of monocrystalline silicon, which is ultimately used in the production of integrated circuits and electronic devices. It is one of the basic raw materials with the largest consumption and highest purity requirements in the information industry. It is also a product and industry that the state encourages the development of. [0003] The world’s advanced polysilicon production technology has always been monopolized by companies in the United States, Japan, and Germany. Each company has its own technical secrets and technical characteristics. After continuous research and development, its own production technology has been fo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B3/50C01B3/52B01D53/04B01D53/14B01D53/00
Inventor 沈祖祥严大洲汤传斌肖荣晖毋克力
Owner CHINA ENFI ENGINEERING CORPORATION
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