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Production method of antireflection film, antireflection film, polarizing plate and image display device

An image display device, display device technology, applied to the surface coating liquid device, identification device, polarizing element, etc., can solve the problems of inability to obtain hardness, increase in production cost, concentration limit, etc., and achieve excellent scratch resistance , Enhanced scratch resistance, high anti-reflective properties

Inactive Publication Date: 2008-12-10
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in order to effectively form a web-like (web) antireflection film, the allowable concentration for substitution with nitrogen gas is limited, and sufficiently high hardness cannot be obtained
[0008] Patent Documents 5-10 specifically describe the nitrogen replacement method, but in order to reduce the oxygen concentration to a level that can sufficiently cure a thin film such as a low-refractive index layer, a large amount of nitrogen gas is required, which causes a problem of increased production cost
[0009] In addition, Patent Document 11 describes a method of winding a film around the surface of a heating roller and irradiating ionizing radiation thereon, but this is still insufficient to satisfactorily cure a special film such as a low-refractive index layer

Method used

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  • Production method of antireflection film, antireflection film, polarizing plate and image display device
  • Production method of antireflection film, antireflection film, polarizing plate and image display device
  • Production method of antireflection film, antireflection film, polarizing plate and image display device

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preparation example Construction

[0108] The production method of the antireflection film of the present invention is characterized in that at least one layer of the multilayers superimposed on the transparent substrate of the antireflection film is formed by the following layer forming method.

[0109] The method of forming the first to fifth layers according to the present invention will be described in detail below. (First layer formation method)

[0110] A layer forming method comprising the following steps (1) and (2):

[0111] (1) the step of applying a coating on a transparent substrate, and

[0112] (2) A step of curing the coating layer by irradiating ionizing radiation in an atmosphere having an oxygen concentration lower than that in air.

[0113] (Second layer formation method)

[0114] A layer forming method comprising the following steps (1)-(3), wherein the conveying step (2) and the curing step (3) are performed continuously:

[0115] (1) the step of applying a coating on a transparent subs...

Embodiment 1

[0403] The present invention is described in detail below with reference to examples, but the present invention should not be construed as being limited to these examples.

[0404] In the examples, "part" means "part by mass".

[0405] (Preparation of coating solution for hard coat layer)

[0406] The following compositions were put into a mixing tank and stirred to prepare a coating solution for a hard coat layer.

[0407] To 750.0 parts by weight of trimethylolpropane triacrylate (BISCOTE #295 (manufactured by Osaka Yuki Kagaku)), 270.0 parts by weight of polyglycidyl methacrylate with a weight average molecular weight of 15,000, 730.0 parts by weight of methyl Ethyl ketone, 500.0 parts by mass of cyclohexanone, and 50.0 parts by mass of a photopolymerization initiator (IRGACURE 184, produced by Ciba Specialty Chemicals) were stirred. The resulting solution was filtered with a filter made of polypropylene having a pore diameter of 0.4 μm to prepare a coating solution for a...

Embodiment 2

[0450] Samples 113-118 were prepared in the same manner as samples 102, 103, 104, 105, 108 and 109 of Example 1 and evaluated in the same manner except that the films were passed through the nitrogen purge zone prior to the UV exposure zone. Samples 119 and 120 were prepared according to the preparation method of sample 105 in Example 1, except that the film was passed through the nitrogen replacement zone before the ultraviolet irradiation zone.

[0451] In the case where the film is heated after ultraviolet irradiation, this is done by bringing the irradiated film into contact with a rotating metal roll through which hot water or pressurized steam is passed.

[0452]

[0453] Table 4 shows the results. Scratch resistance was improved by passing the film through a nitrogen purge zone with low oxygen concentration prior to UV exposure. Curing is made significant by combining the step of passing the film through a heated nitrogen purge zone with low oxygen concentration aft...

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Abstract

To provide a production method of an antireflection film excellent in the scratch resistance while having sufficiently high antireflection performance; an antireflection film obtained by the production method; and a polarizing plate and an image display device each comprising the antireflection film. A method for producing an antireflection film comprising a transparent substrate having thereon an antireflection layer comprising at least one layer, the production method comprising forming at least one layer on the transparent support by a layer forming method comprising the following steps (1) and (2): (1) a step of applying a coating layer on a transparent substrate, and (2) a step of curing the coating layer by irradiating ionizing radiation in an atmosphere having an oxygen concentration lower than the oxygen concentration in the air.

Description

[0001] This application is submitted on March 23, 2005. The international application number is PCT / JP2005 / 005202, and the Chinese national application number is 200580009527.X. device" application. technical field [0002] The present invention relates to a production method of an antireflection film having low reflectivity and excellent scratch resistance, and an antireflection film obtained by the production method. Furthermore, the present invention relates to a polarizing plate and an image display device each including the antireflection film. Background technique [0003] In a display device such as a cathode ray tube display device (CRT), a plasma display panel (PDP), an electroluminescent display device (ELD), and a liquid crystal display device (LCD), an antireflection film is provided on the outermost surface of the display device to By reducing the reflectance by using the principle of optical interference, it prevents the decrease in contrast due to the reflect...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11G02B5/30G02F1/1335G09F9/00B05D3/06B32B7/02B32B27/30
CPCG02B1/111G02B5/3016G02B1/14B32B7/02B32B27/08
Inventor 大谷薰明福重裕一
Owner FUJIFILM CORP
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