Apparatus and method of polymer photoresist ultrasonic ageing effect
A technology of ultrasonic aging and photoresist, which is applied in photosensitive material processing, electrical components, semiconductor/solid-state device manufacturing, etc., to achieve the effects of reducing research and development costs, avoiding substrate bending, and reducing internal stress
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[0012] To carry out ultrasonic aging by using the invention, firstly, a photoresist microstructure is made on a silicon wafer. The fabrication process of the photoresist microstructure includes silicon wafer cleaning, gluing, pre-baking, exposure, post-baking, and development.
[0013] Firstly, the silicon wafer is cleaned, using the standard process of cleaning silicon wafers in the laboratory, successively boil the silicon wafer with concentrated sulfuric acid, No. 1 cleaning solution, and No. 2 cleaning solution, then rinse it with deionized water, and finally put it in an oven for drying. After drying, make a photoresist layer, spin SU-8 photoresist by spin coating, put it on a hot plate for drying, then expose it to ultraviolet light, and then put it on a hot plate and dry it to make the SU-8 glue cross-linked .
[0014] Since the stress of the photoresist structure mainly occurs during the post-baking process, the adhesive layer is subjected to ultrasonic aging after th...
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