Method for manufacturing gallium nitride nano-wire with tungsten auxiliary heat anneal
A technology of nanowires and auxiliary heat, applied in gaseous chemical plating, semiconductor/solid-state device manufacturing, ion implantation plating, etc., can solve the problems of high requirements for gas path structure and experimental equipment, and achieve the effect of low preparation requirements
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Embodiment 1
[0022] Embodiment 1: adopt MOCVD method in Al 2 o 3 A GaN film with a thickness of 2 microns was epitaxially grown on the substrate, and this film was used as a template, and an 8nm thick metal W thin layer was deposited on the template at a temperature of 500°C by electron beam evaporation, and then the metal layer with the metal layer The template is put into the thermal annealing reaction chamber, under N 2 The atmosphere was heated up to 1050°C and annealed for 20 minutes. The sample measurement results show that the GaN nanowires grown by this method have a diameter between 10 and 100 nm and a high aspect ratio.
Embodiment 2
[0023] Embodiment 2: The same result can be obtained by using the method as in Embodiment 1 with SiC, Si or GaAs as the substrate.
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