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Method for manufacturing a hybrid microlens

A technology of micro-lens and light guide plate, applied in the field of micro-molding, can solve problems such as not being able to obtain a uniform structure easily, and achieve the effect of reducing production time and production cost

Inactive Publication Date: 2008-05-07
KOREA INST OF IND TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is a problem that a uniform structure cannot be easily obtained since the pattern is formed by machining treatment or etching treatment

Method used

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  • Method for manufacturing a hybrid microlens
  • Method for manufacturing a hybrid microlens
  • Method for manufacturing a hybrid microlens

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Embodiment Construction

[0032] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0033] In the following description, detailed descriptions of known related functions and configurations may be omitted to avoid unnecessarily obscuring the subject matter of the present invention.

[0034] In addition, the terms used in the description are defined in consideration of the functions of the present invention, and these terms may be changed according to the user's or operator's intention or customary habits. Therefore, definitions should be made based on the entire specification.

[0035] In the present invention, a mask 21 to be used for exposure processing as shown in FIG. 1 is manufactured first. Here, as for the mask, a thin film mask or a chrome mask can be used depending on the precision of the pattern. In the case of using a chromium mask, the mask can be manufactured with an accuracy of about 1 μm.

[0036] FIG. ...

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Abstract

The invention provides a method for manufacturing a hybrid microlens. The method for manufacturing a hybrid microlens of a light guide plate by using semiconductor reflow processing includes: a first step, aligning a mask on a substrate coated with photoresist, wherein the The mask is formed with a light-transmissive first region and a plurality of light-impermeable second regions, and these second regions have different sizes and shapes to form a mixed array; a second step, performing at least one tilt in such a manner Exposure and vertical exposure, that is, the light radiated from the top to the bottom of the second region forming the mixed array has an asymmetric tilt angle in at least one direction; the third step is to develop the obliquely exposed substrate to obtain various The size and shape of the hybrid photoresist column; the fourth step, performing a reflow process to bend the hybrid photoresist column, so that the hybrid microlens pattern can be obtained; the fifth step, fabricating a concave emboss with a concave hybrid microlens pattern engraved therein a mold; and a sixth step of forming a light guide plate by using a concave die as a mold, so that a hybrid microlens pattern in the form of a convex pattern can be formed in the light guide plate.

Description

technical field [0001] The present invention relates to a micropattern machining technology and a micro-molding technology, and in particular to a method for manufacturing a hybrid microlens and a light guide plate manufactured by the method, and the hybrid microlens is used to control a microlens array, Light diffusion, light scattering and viewing angle in light guide plates etc. Background technique [0002] In general, a backlight unit of a liquid crystal display (LCD) is used as an illumination device that uniformly provides light across an entire panel of the liquid crystal display, and the panel of the liquid crystal display appropriately controls the amount of light to be transmitted so that an image can be displayed thereon. [0003] Contrary to CRTs, PDPs and FEDs, LCDs are non-luminous devices and thus cannot be used in dark places without light. [0004] In order to overcome such disadvantages so that the liquid crystal display can be used in dark places, a back...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13357G02F1/1335
CPCG02B3/0031G02B6/0036G02B3/005G02B3/0043G02B6/0061G02B6/0065G02B6/005G02B3/0018A61B3/12A61B2560/04
Inventor 黄喆珍金锺鲜高荣培许英茂
Owner KOREA INST OF IND TECH
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