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Method for producing titanium nitride membrane at room temperature

A technology for titanium nitride and thin films, which is applied in the field of preparing titanium nitride thin films at room temperature, can solve the problems of few reports on titanium nitride thin films, and achieve the effects of convenient operation, good adhesion and simple process

Inactive Publication Date: 2008-01-23
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, a lot of research work has been done on the preparation of titanium nitride thin films at high temperature, but there are few reports on the deposition of titanium nitride thin films at room temperature.

Method used

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  • Method for producing titanium nitride membrane at room temperature
  • Method for producing titanium nitride membrane at room temperature
  • Method for producing titanium nitride membrane at room temperature

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Example 1: A titanium nitride thin film was prepared on a Ti surface by an electrophoretic deposition method at room temperature. After cleaning, the Ti sheet (thickness 0.25mm, area 3.14cm 2 ) is fixed in the electrolytic cell, and the opposite electrode adopts a metal Pt sheet, the potential of the potentiostat is adjusted to 10V, the distance between the electrodes is 1cm, and the nano-titanium nitride suspension containing 10g / L is used for electrophoretic deposition for 1 hour to obtain Dark yellow TiN film. The obtained TiN thin film can be used in decorative materials. The current-time curve of the electrophoretic deposition process is shown in Fig. 3 .

Embodiment 2

[0015] Example 2: A titanium nitride film was prepared on the surface of Ni / Cr stainless steel by electrophoretic deposition. Cleaned stainless steel (with an area of ​​3.14cm 2 ) is fixed in the electrolytic cell, the counter electrode adopts a metal Pt sheet, the potential of the potentiostat is adjusted to 20V, and the nano-titanium nitride suspension containing 210g / L is used for electrophoretic deposition for 0.5 hour to obtain a golden yellow TiN film. The current-time curve of the electrophoretic deposition process is shown in Fig. 4 .

Embodiment 3

[0016] Embodiment 3: prepare titanium nitride thin film on Ti surface by electrophoretic deposition method, after cleaning Ti (area is 1cm 2 ) was fixed in the electrolytic cell, using a metal Pt sheet as the counter electrode, adjusting the input voltage of the DC stabilized voltage to 10V, 5g / L nano-titanium nitride suspension, and electrophoretic deposition for 8 hours to obtain a blue TiN film. The comparison of the XRD results after electrophoretic deposition and the XRD results of TiN powder is shown in Figure 5. It can be seen from the figure that TiN has been successfully deposited on the substrate surface.

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Abstract

The invention pertains to the technical field of film, in particular to a method for preparing titanium nitride film under room temperature. Wherein, nanometer powder of titanium nitride is taken as raw material, a DC stabilized power supply or constant potential meter is used in such a way that the positive pole of the DC stabilized power supply is connected with an electro conductive base, the negative pole is connected with a pair-electrode platinum sheet or graphite; the input voltage of the DC stabilized power supply or the constant potential meter is adjusted to 10 swung dash 20 V, the time for electrophoresis is controlled to be 0.5 swung dash 10 hour; the electrolyte is turbid liquid containing 5 swung dash 20g / L nanometer titanium nitride; the solution is magnetically mixed during the electrophoresis deposition; when the power is on, the titanium nitride deposits on the job's surface to form color titanium nitride film. The TiN film prepared by the invention is of special color and good adhesive, in addition, the process in the invention is simple, easy to operate and requires no hi-temp atmosphere.

Description

technical field [0001] The invention belongs to the technical field of thin films, and in particular relates to a new method for preparing titanium nitride thin films at room temperature. Background technique [0002] Titanium nitride (TiN) is a new multifunctional material, which has a series of advantages such as high strength, high hardness, high temperature resistance, acid and alkali corrosion resistance, wear resistance, good electrical conductivity and thermal conductivity, and is widely used in the preparation of Metal ceramics, cutting tools, molds, and crucibles for melting metals, lining materials for electrodes for molten salt electrolysis of metals, coating materials for electrical contacts and metal surfaces. TiN coating, commonly known as titanium gold, has an attractive golden yellow metallic luster. As a gold substitute decoration material, TiN not only has a luxurious golden effect, but also has better hardness and wear resistance than gold, thus greatly i...

Claims

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Application Information

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IPC IPC(8): C25D13/02
Inventor 崔晓莉马明
Owner FUDAN UNIV
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