Inline process type coating apparatus

Abstract

The invention relates to an inline process type coating apparatus which is acceptable for coating substrate by using photoresist for photolithography and is capable of preventing bad coating layer of the photoresist. The invention includes: workbench whose working surface length is enough for completing coating work within the substrate transportation process; suspending bench which makes the substrate to flatly float on the working surface by using gas spraying pressure; conveyer for adsorbing and fixing the floated substrate as well as transporting the substrate along the working surface via driving force form driving source; narrow slit type coating means which has narrow slit for releasing and coating the photoresist on the substrate moving along the working surface; releasing regulation means has a flat surface which separably contacts with end of the releasing slit, and which, contacting with the flat surface, push-presses the photoresist sticked on the end of the releasing slit to distribute the photoresist homogeneously along the cutting direction of the releasing slit.

Description

technical field [0001] The present invention relates to an on-line coating device, in particular to a coating operation suitable for coating a photoresist for photolithography on a substrate, which can prevent the formation of a defective coating of the photoresist, and An inline process type coating apparatus that can realize the on-line of the entire lithographic printing process. Background technique [0002] Generally, in the manufacturing process of various flat panel display substrates, a photolithography method is used as a method of forming a predetermined pattern on the surface of the substrate. [0003] The steps of this method are as follows. First, a photosensitive material is coated on the surface of the substrate, and then a series of operations such as exposure, development, and etching are performed on the coated surface coated with the photosensitive material. [0004] In the coating operation, a photoresist is generally used as a photosensitive substance, ...

AI Technical Summary

Problems solved by technology

[0011] However, in this coating method, since the slit coating device is directly moved to perform the coating operation in the state where the substrate is placed on the fixed plate, it is difficult to continuously perform the coating operation on multiple substrates.

[0012] In particular, such a discontinuous coating operation makes it difficult to realize the online operation of the entire photolithography process and its equipment, so the operation is complicated and takes too much time, thereby reducing production efficiency

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