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Fluorine gas generator

a technology of fluorine gas and generator, which is applied in the direction of electrolytic organic production, manufacturing tools, instruments, etc., can solve the problems of difficult safe treatment of certain gases, short supply, and difficulty in storing certain amounts of gas, so as to simplify the piping between the electrolyzer and the water heating devi

Inactive Publication Date: 2012-03-06
TOYO TANSO KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The solution effectively prevents gas mixing and ensures safe treatment of leaks, improving safety and ease of maintenance by compartmentalizing the generator into distinct areas for handling fluorine and hydrogen gases separately, ensuring high-purity gas production and efficient operation.

Problems solved by technology

Furthermore, NF3 gas is rather in short supply due to the rapidly increasing demand therefor and, accordingly, a problem arises that a certain amount of the gas should be always in storage.
However, since all relevant production plants are not always equipped with safety means exclusively for on-demand and on-site fluorine gas generators and since various gases are used or generated in or from fluorine gas generators, it is difficult to safely treat those gases which have incidentally leaked out of the fluorine gas generators due to some or other trouble.
It has been found that there is a problem, namely such requirements cannot always be met.

Method used

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Embodiment Construction

[0029]In the following, a typical embodiment of the fluorine gas generator of the invention is described referring to the accompanying drawings.

[0030]FIG. 1 is a schematic representation of the main parts of a fluorine gas generator according to the invention. In FIG. 1, the section 100 surrounded by a dot-and-dash line indicates a box-shaped body. As shown in FIG. 2 and FIG. 3, the box-shaped body 100 has an approximately rectangular shape. The inside of this box-shaped body 100 is divided into a first compartment 101, a second compartment 102, and a third compartment 103. This partitioning is realized by means of partition walls 105 and 106 extending from top to bottom. Due to the partitioning effect of these partition walls 105 and 106, the gases in different compartments cannot be mixed together. In FIG. 1, the portion 101 surrounded by a broken line indicates the first compartment, the portion 102 the second compartment, and the portion 103 the third compartment.

[0031]In the fi...

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Abstract

A fluorine gas generator is provided with which the gases used and / or generated, in case of leakage thereof, can be prevented from mixing together as far as possible and, even in case of gas leakage into the outside of the generator system, the leakage gas can be treated safely and in which the maintenance, exchange and other operations are easy to carry out. The generator comprises a box-shaped body containing an electrolyzer for fluorine gas generation, and the box-shaped body is divided into two or more compartments, including a compartment containing the electrolyzer.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a fluorine gas generator and, more particularly, to a fluorine gas generator for producing high-purity fluorine gas having a very low impurity content and suited for use in the process of manufacturing semiconductors and so on.[0003]2. Description of the Prior Art[0004]Fluorine gas is a basic gas indispensable in the field of semiconductor production, for instance. While it is used as such in some instances, the demand in particular for nitrogen trifluoride gas (hereinafter referred to as “NF3 gas”) and the like synthesized based on fluorine gas for use as cleaning gases or dry etching gases for semiconductors has been rapidly increasing. Further, neon fluoride gas (NeF gas), argon fluoride gas (ArF gas), krypton fluoride gas (KrF gas) and the like are excimer laser oscillator gases used in the step of patterning integrated semiconductor circuits, and the raw materials therefor in freque...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): C25B9/00C25B1/24C01B7/20C25B15/00
CPCC25B1/245C25B15/00C25B9/00C25B9/75C25B15/02C25B15/08C01B7/20
Inventor HIRAIWA, JIROYOSHIMOTO, OSAMUTOJO, TETSURO
Owner TOYO TANSO KK
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