One-dimensional titanium nanostructure and method for fabricating the same

Abstract

A one-dimensional titanium nanostructure and a method for fabricating the same are provided. A titanium metal reacts with titanium tetrachloride to form the one-dimensional titanium nanostructure on a heat-resistant substrate in a CVD method and under a reaction condition of a reaction temperature of 300-900° C., a deposition temperature of 200-850° C., a flow rate of the carrier gas of 0.1-50 sccm and a reaction time of 5-60 hours. The titanium nanostructure includes titanium nanowires, titanium nanobelts, flower-shaped titanium nanowires, titanium nanorods, titanium nanotubes, and titanium-titanium dioxide core-shell structures. The titanium nanostructure can be densely and uniformly grown on the heat-resistant substrate. The present invention neither uses a template nor uses the complicated photolithographic process, solution preparation process, and mixing-coating process. Therefore, the process scale-up, cost down, and the simplified production process are achieved.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a metallic nanostructure synthesis technology particularly to a one-dimensional titanium nanostructure and a method for fabricating the same.[0003]2. Description of the Related Art[0004]The current metallic nanostructure synthesis technology includes a photolithographic method, a hard template method, a seed-mediated growth method and a de-alloy method.[0005]In the photolithographic method, a layer of photoresist is coated on a substrate and illuminated by the light filtered by a photomask. The pattern of the photomask reflects incident light. The light passing the photomask has a pattern identical to the pattern of the photomask and selectively exposes the photoresist coated on the substrate, whereby the pattern of the photomask is completely duplicated to the photoresist. After the abovementioned exposing step, the exposed photoresist is developed to reproduce the pattern of the photom...

AI Technical Summary

Benefits of technology

This patent describes a method for making a high surface area titanium nanostructure using a chemical vapor deposition (CVD) method on a heat-resistant substrate. This method reduces the cost and process time and allows for larger scale production. Additionally, the patent describes how the CVD system can be used to create one-dimensional titanium nanostructures with different morphologies, including monocrystalline or polycrystalline, and with a high aspect ratio. These structures are uniformly distributed on the substrate.

Problems solved by technology

The method has disadvantages of expensive equipment and complicated processes.

Further, the wavelength of the laser limits the size of nanowires.

The metallic nanostructure fabricated by the method is likely to have many tumbling defects.

Besides, the method needs to fabricate a template beforehand and thus has a very complicated process.

However, the method has a low yield in the scaled-up process.

Besides, the uniformity of the mixing-coating process may affect the performance of the nanostructures.

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