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Methods and Apparatus for Forming Multi-Layer Structures Using Adhered Masks

a mask and multi-layer technology, applied in the field of electrochemical fabrication, can solve the problems of destructive separation of masking material from the substrate, and achieve the effects of reducing the cost of electrochemical fabrication, improving structural properties, and reducing fabrication tim

Inactive Publication Date: 2009-12-10
MICROFAB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This approach enhances the formation of multi-layer structures with improved structural properties, reduces fabrication costs, and accelerates the production process by enabling the use of multiple materials and precise layer control.

Problems solved by technology

The CC mask plating process is distinct from a “through-mask” plating process in that in a through-mask plating process the separation of the masking material from the substrate would occur destructively.

Method used

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  • Methods and Apparatus for Forming Multi-Layer Structures Using Adhered Masks
  • Methods and Apparatus for Forming Multi-Layer Structures Using Adhered Masks
  • Methods and Apparatus for Forming Multi-Layer Structures Using Adhered Masks

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first embodiment

[0169]FIGS. 5(a)-(ii) illustrate schematic side views of the states of the process and apparatus components involved in forming a sample structure according to the invention. In this embodiment, a carrier is provided for carrying a substrate on which layers of material will be formed during fabrication of a structure.

[0170]FIG. 36(a)-(d), schematically depict side views of various relationships between a carrier and a substrate that may be used in some embodiments of the invention. FIG. 36(a) depicts a substrate without a carrier and thus indicates that in some embodiments of the invention, a substrate 192 may be used without a carrier. FIGS. 36(b)-36(c) depict some other relationships that may exist in other embodiments. In some embodiments a carrier 194 may have the same size as the substrate 192, as shown in FIG. 36(b). Other embodiments may use a carrier 196 that is larger than the substrate 192, as shown in FIG. 36(c). Still other embodiments, may be use or include a carrier 19...

second embodiment

[0227]Both embodiments allow for alignment of each successive photomask pattern to carrier 1 (i.e., to substrate 25) rather than to the previously-deposited layer, to advantageously avoid the accumulation of errors that can lead to poor registration of layers. In the first approach, imaging system 49 (here assumed to be an electronic camera with microscope optics, though direct observation is also possible with the second embodiment) can be moved vertically on precision stage 50, preferably having excellent straightness of travel with minimal roll, pitch, and yaw or translation other than axial. Stage 50 is preferably aligned so that its axis of travel is both extremely parallel to the optical axis of system 49, and extremely perpendicular to the photomask bottom surface (i.e., coating 39).

[0228]In the position shown, system 49 can focus on target 35 in its current position. As layers are added and carrier 1 descends gradually, system 49 can be lowered on stage 50 in order to remain...

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Abstract

Numerous electrochemical fabrication methods and apparatus are provided for producing multi-layer structures (e.g. having meso-scale or micro-scale features) from a plurality of layers of deposited materials using adhered masks (e.g. formed from liquid photoresist or dry film), where two or more materials may be provided per layer where at least one of the materials is a structural material and one or more of any other materials may be a sacrificial material which will be removed after formation of the structure. Materials may comprise conductive materials that are electrodeposited or deposited in an electroless manner. In some embodiments special care is undertaken to ensure alignment between patterns formed on successive layers.

Description

RELATED APPLICATIONS[0001]This application is a divisional of U.S. patent application Ser. No. 10 / 841,272 (Microfabrica Docket No. P-US098-A-MF), filed May 7, 2004 which in turn claims benefit of U.S. Provisional Application Nos. 60 / 468,741 and 60 / 474,625 filed on May 7, 2003 and May 29, 2003, respectively. These referenced applications are hereby incorporated herein by reference as is set forth in full herein.FIELD OF THE INVENTION[0002]Embodiments of the invention relate generally to the field of electrochemical fabrication and the associated formation of three-dimensional structures (e.g. microscale or mesoscale structures). In particular, they relate to the formation of such structures using patterned masks that are temporarily adhered to substrates or to previously formed deposits that may be used for performing selective patterning of or on the substrates or previously deposited material.BACKGROUND OF THE INVENTION[0003]A technique for forming three-dimensional structures (e.g...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C25D5/02C25F5/00C25D1/00C25D5/10C25D5/14C25D5/48C25D5/50
CPCC25D1/00C25D5/022C25D5/10C25D5/14C25D5/02C25D5/50C25D1/003C25D1/20C25D5/48
Inventor COHEN, ADAM L.THOMASSIAN, JILL R.LOCKARD, MICHAEL S.KILGO, III, MARVIN M.FRODIS, URISMALLEY, DENNIS R.
Owner MICROFAB
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