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Ultraviolet light block and photocatalytic materials

a technology of ultraviolet light and photocatalysis materials, applied in the field of metal oxide particles, can solve the problems of increasing the risk of exposure to ultraviolet light from natural sun light in parts of the world, and the detrimental effect of ultraviolet light on biological organisms

Inactive Publication Date: 2005-10-20
NANOGRAM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0015] Other features and advantages of the invention are evident from the detailed description and claims below.

Problems solved by technology

While ultraviolet light can be useful in commercial processing, contact with ultraviolet light has a detrimental effect on biological organisms.
The risk from exposure to ultraviolet light from natural sun light is increasing in portions of the world due to occasional significant drops in the UV-absorbing ozone layer.

Method used

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  • Ultraviolet light block and photocatalytic materials
  • Ultraviolet light block and photocatalytic materials
  • Ultraviolet light block and photocatalytic materials

Examples

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Embodiment Construction

[0026] Metal oxide particles with average diameters less than about 1000 nm and especially less than about 100 nm have been found to be useful components for systems designed to block or to exploit UV light. Titanium dioxide (TiO2), zinc oxide (ZnO), zinc dioxide (ZnO2) and cerium dioxide (CeO2) are of particular interest. Because of the small size of the particles, optical scattering becomes negligible so that the particles become generally transparent to visible light. On the other hand, the UV absorption properties of the particles can be controlled by appropriate selection of the distribution of particle diameters. Laser pyrolysis, as described below, is an efficient method for producing metal oxide particles with a selected average particle diameter and a narrow distribution of diameters.

[0027] A basic feature of successful application of laser pyrolysis for the production of nanoscale metal oxide particles is production of a molecular stream containing a metal precursor compo...

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Abstract

Nanoscale UV absorbing particles are described that have high UV absorption cross sections while being effectively transparent to visible light. These particles can be used to shield individuals from harmful ultraviolet radiation. These particles can also be used in industrial processing especially to produce solid state electronic devices by creating edges of photoresist material with a high aspect ratio. The UV absorbing particles can also be used as photocatalysts that become strong oxidizing agents upon exposure to LV light. Laser pyrolysis provides an efficient method for the production of suitable particles.

Description

CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application is a divisional of copending U.S. patent application Ser. No. 09 / 566,476 to Kambe et al., entitled “Ultraviolet Light Block And Photocatalytic Materials,” which is a continuation of U.S. Pat. No. 6,099,798 to Kambe et al., entitled “Ultraviolet Light Block And Photocatalytic Materials,” both of which are incorporated herein by reference.FIELD OF THE INVENTION [0002] The present invention relates to metal oxide particles that are effective at absorbing ultraviolet light for use in UV blocks and photocatalytic materials. The invention further relates to methods for the production of the metal oxide particles. BACKGROUND OF THE INVENTION [0003] While ultraviolet light can be useful in commercial processing, contact with ultraviolet light has a detrimental effect on biological organisms. Harmful ultraviolet light can come from both sun light and from artificial light sources. The risk from exposure to ultraviolet light from...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): A61K8/19C01G23/04A61K8/27A61K8/29A61Q17/04H01J61/35H01J61/40H05K3/00
CPCA61K8/19A61K8/27A61K8/29A61K2800/413A61Q17/04B82Y5/00Y10T428/2993H01J61/40H05K3/0076Y10S428/913F21V3/0472Y10T428/2982H01J61/35F21V3/10Y10T428/8305
Inventor KAMBE, NOBUYUKIBI, XIANGXIN
Owner NANOGRAM
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