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Process of forming fluoric stepped hole structure on the surface of pure titanium dental implant

A dental implant and pure titanium technology, which is applied in the field of preparing fluorine-containing multi-level pore structure, can solve the problems of negative impact on the long-term stability of implants, and achieve the effect of improving long-term clinical success rate and good bone tissue compatibility

Inactive Publication Date: 2007-06-27
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

They used titanium dioxide particles to sandblast the surface of pure titanium, and then treated it with low-concentration hydrofluoric acid to change the crystal structure of the titanium dioxide layer on the surface, and a small amount of fluorine ions were combined in the metallographic structure, with a content between 2at% and 5at%. time, but the surface remains a large number of titanium dioxide particles, which may negatively affect the long-term stability of the implant

Method used

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  • Process of forming fluoric stepped hole structure on the surface of pure titanium dental implant

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] (1) The surface of the pure titanium dental implant is sandblasted with large particles (0.25~1.5mm) of green silicon carbide, and the pressure is 4bar, so that the surface forms an irregular rough surface with ups and downs, that is, micron-sized pits, with a diameter of 10~ 30 μm; place in acetone, 75% ethanol and distilled water for ultrasonic cleaning, and dry;

[0016] (2) With 5.60mol / L HCl and 8.70mol / L H 2 SO 4 The mixed solution was treated at 70°C for 40 minutes, rinsed with double distilled water, and dried to form submicron-scale small pits on the surface on the basis of large pits, with a diameter of 0.2-3 μm.

[0017] (3) Use 0.055mol / L HF and 0.07mol / L HNO again 3 The formed mixed solution was treated for 15 minutes, rinsed with double distilled water, and dried to obtain a surface with a fluorine-containing multi-level pore structure (as shown in Figure 1, the left figure is 5000 times, the right figure is 2000 times), and the fluorine content is betwe...

Embodiment 2

[0019] (1) The surface of the titanium dental implant is sandblasted with large particles (0.25-1.5 mm) of green silicon carbide, and the pressure is 4 bar, so that the surface forms an irregular rough surface with ups and downs, that is, micron-sized pits, with a diameter of 10-30 μm ; Then place in acetone, 75% ethanol and distilled water for ultrasonic cleaning, and dry;

[0020] (2) With 5.80mol / L HCl and 9.00mol / L H 2 SO 4 The mixed solution was treated at 80°C for 30 minutes, rinsed with double distilled water, and dried to form small submicron pits on the surface on the basis of large pits, with a diameter of 0.2 to 3 μm.

[0021] (3) Use 0.055mol / L HF and 0.09mol / L HNO again 3 The formed mixed solution is treated for 10 minutes, rinsed with double distilled water, and dried to obtain a surface with a fluorine-containing multi-level hole structure, and the fluorine content is between 1.5 at% and 5 at%.

[0022] (4) Soak in 4% sodium fluoride solution for 1 hour at la...

Embodiment 3

[0024] (1) The surface of the titanium dental implant is sandblasted with large particles (0.25-1.5 mm) of green silicon carbide, and the pressure is 4 bar, so that the surface forms an irregular rough surface with ups and downs, that is, micron-sized pits, with a diameter of 10-30 μm ; Then place in acetone, 75% ethanol and distilled water for ultrasonic cleaning, and dry;

[0025] (2) With 6.00mol / L HCl and 9.20mol / L HCl 2 SO 4 The mixed solution was treated at 90°C for 20 minutes, rinsed with double distilled water, and dried to form small submicron pits on the surface on the basis of large pits, with a diameter of 0.2 to 3 μm.

[0026] (3) Use 0.11mol / L HF and 0.11mol / L HNO again 3 The formed mixed liquid is treated for 5 minutes, rinsed with double distilled water, and dried to obtain a surface with a fluorine-containing multi-level hole structure, and the fluorine content is between 1.5 at% and 5 at%.

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Abstract

The process of forming fluoric stepped hole structure on the surface of pure titanium dental implant includes sand blasting the pure titanium implant, etching in mixed solution of sulfuric acid and hydrochloric acid, etching in mixed solution of hydrofluoric acid and nitric acid, soaking in sodium fluoride solution and other steps. The pure titanium dental implant with stepped hole surface structure has excellent bone tissue compatibility, capacity of raising the combination strength of the implant to the bone tissue and raised long term clinical success rate of dental implant.

Description

technical field [0001] The invention relates to a fluorine-containing artificial tooth root implant, in particular to a method for preparing a fluorine-containing multilevel hole structure on the surface of a pure titanium dental implant. Background technique [0002] In order to shorten the implant-bone tissue healing time, increase the osseointegration rate, and obtain a more long-term and reliable clinical effect, in recent years, the research on the surface activation treatment of pure titanium implants has been increasing, and it has become a clinical field in the field of biomaterials and implant surgery. research hotspots. Fluoride is widely used to prevent and treat dental caries and osteoporosis. Low doses of fluorine are essential for the growth, development, reproduction, and bone metabolism of mammals. Very low doses of fluoride have the specificity of stimulating the proliferation and differentiation of osteoblast-like cells, but high doses of fluoride show an ...

Claims

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Application Information

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IPC IPC(8): A61C8/00A61C13/08
Inventor 何福明赵士芳杨国利
Owner ZHEJIANG UNIV
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