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Gas calibration method for semiconductor equipment

A semiconductor and gas technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device testing/measurement, electrical components, etc., can solve the problems of long calibration time, high cost, and limited cost, and achieve large calibration range and low cost , Calibration fast effect

Active Publication Date: 2006-10-18
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Problems solved by technology

In order to test the accuracy of MFC, a MFV (Mass Flow Verifier, mass flow calibrator) is also needed in the process to detect MFC. However, due to the limited range of MFV verifiable, the requirements for gas stability are relatively high. high, the calibration time is long, and its cost is expensive. The technical solution of the present invention proposes a new way to calibrate the MFC. The calibration range can be larger, the calibration is faster, and basically no additional equipment is needed, achieving better Calibration results for

Method used

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  • Gas calibration method for semiconductor equipment

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Embodiment Construction

[0017] The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0018] Hardware connection structural diagram of the present invention, as figure 1 shown. The gas enters the chamber from the air inlet of the reaction chamber through the mass flow controller, and the mass flow controller, temperature controller, pressure sensor, and molecular pump are connected to the industrial computer, and the gas calibration program runs on the industrial computer.

[0019] The program flowchart of the present invention, as figure 2 shown. First, use a molecular pump to evacuate the reaction chamber to a general vacuum, and use nitrogen to flush the gas pipeline, open the gas inlet and outlet of the reaction chamber, and set the gas flow rate of this path to Qs (unit: sccm).

[0020] Close the gas outlet of the reaction chamber, and detect the pressure value of the reaction chamber until it stabilizes at P1 ...

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Abstract

The present invention provides gas calibration method for semiconductor equipment. After certain amount of gas is introduced through mass flowmeter to closed chamber, the pressure change before and after gas introduction is measured and inside gas mass change is calculated based on the gas state equation, so as to judge whether the mass flowmeter has normal operation. Compared with available technology, the present invention has the advantages of wide calibration range, fast calibration, low cost and excellent calibration effect.

Description

technical field [0001] The invention relates to the field of semiconductor etching, in particular to a gas calibration method in semiconductor equipment. Background technique [0002] In the semiconductor process, it is often necessary to precisely control the gas flow of the gas path to ensure the stability of the process, and an MFC (Mass Flow Controller, mass flow controller) is usually used to set the gas flow. In order to test the accuracy of MFC, a MFV (Mass Flow Verifier, mass flow calibrator) is also needed in the process to detect MFC. However, due to the limited range of MFV verifiable, the requirements for gas stability are relatively high. high, the calibration time is long, and its cost is expensive. The technical solution of the present invention proposes a new way to calibrate the MFC. The calibration range can be larger, the calibration is faster, and basically no additional equipment is needed, achieving better calibration results. Contents of the inventi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05D7/00G01F1/34H01L21/302H01L21/66
Inventor 付金生
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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