System and method for automatically transferring a defect image from an inspection system to a database
A technology of inspection system and database, applied in the field of lithography, can solve the problems of reducing money and wasting time, and achieve the effect of reducing operator errors
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[0019] by reference Figure 1 to Figure 4 , the preferred embodiment of the present invention and its advantages can be understood to the greatest extent, and the same numerals in the figures are used to denote the same or corresponding parts.
[0020] figure 1 Shown is a cross-sectional view of a photomask assembly 10 that may be inspected by automatically transferring defect images from an inspection system to a database. Photomask assembly 10 includes photomask 12 coupled to pellicle assembly 14 . Substrate 16 and patterned layer 18 cooperate to form part of photomask 12 . Photomask 12 may also be described as a mask or reticle, which may have a variety of sizes and shapes including, but not limited to, generally circular, circular, rectangular, or square. The photomask 12 can also be any kind of photomask type, including but not limited to, a disposable master, a 5 inch reticle, a 6 inch reticle, a 9 inch reticle, or one that can be used to project an image of a circuit...
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