Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Photosensitive resin composition for isolator

A photosensitive resin and spacer technology, which is applied to photosensitive materials, optics, and opto-mechanical equipment for opto-mechanical equipment. Retention rate, sufficient liquid crystal orientation, and effect of reducing defects

Active Publication Date: 2006-02-15
DONGJIN SEMICHEM CO LTD
View PDF0 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, if the spacer or the alignment film is peeled off due to the above-mentioned friction, a display defect will occur; if there is a residue originating from the photosensitive resin composition on the alignment film, abnormality in the orientation of the liquid crystal will also occur.
In addition, in liquid crystal screens and touch screens, since the spacer is in direct contact with the liquid crystal, if ionic substances or impurities are eluted from the spacer, the voltage retention rate will be reduced.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin composition for isolator
  • Photosensitive resin composition for isolator
  • Photosensitive resin composition for isolator

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0065] 30% by weight of an alkali-soluble acrylate resin, 5% by weight of a urethane resin represented by the above chemical formula 4, and 5% by weight of a crosslinkable monomer having at least two ethylenic double bonds represented by the above chemical formula 5 The indicated urethane monomer, 0.5% by weight of Irgacure 907 (manufactured by Ciba Chemical Specialty Products Co., Ltd.) as a photopolymerization initiator, 0.2% by weight of 4,4-bisdiethylaminobenzophenone, 37% by weight of As a solvent, propylene glycol methyl ether acetate, 17% by weight of ethyl 3-ethoxypropionate, and 5.3% by weight of butyl acetate were uniformly mixed to manufacture a liquid photosensitive resin composition for spacers.

Embodiment 2～4 and comparative example 1～3

[0067] Except having used the component and composition ratio shown in following Table 1 in said Example 1, it implemented by the method similar to said Example 1, and manufactured the liquid photosensitive resin composition for spacers. In this case, the unit in Table 1 is "% by weight".

[0068] differentiate

[0069] Table 1 will be described below.

[0070] Alkali-soluble acrylate resin:

[0071] Benzyl methacrylate: methacrylic acid: methyl methacrylate = 60: 20: 20

[0072] Molecular weight: 20,000.

[0073] In chemical formula 1 and chemical formula 2:

[0074] R 1 = methyl, R 2 =methylene, a:b:c=20:20:60, molecular weight: 20,000.

[0075] In chemical formula 4:

[0076] R 3 = 1,6-hexylene, R 4 , R 5 =Methyl group, molecular weight: 3,000.

[0077] In chemical formula 5:

[0078] R 6 = methylene, R 7 =-C(CH 3 ) 2 C 6 h 4 C(CH 3 )=CH 2 , y=6, z=2.

[0079] Using the photosensitive resin compositions for spacers produced i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

To provide a photosensitive resin composition for spacers capable of reducing defects in an unfilled region due to a dropping amount of a liquid crystal, capable of preventing damage by pressure on a color filter, capable of suppressing thickness variation which is unavoidable in a process, free from leaching of ions or impurities in a liquid crystal, not lowering voltage retentivity, having no effect on liquid crystal alignment, and capable of forming spacers excellent in rubbing resistance, having satisfactory voltage retentivity and liquid crystal aligning property, and excellent in developability, high sensitivity, heat stability, dimensional stability and compressive strength. The photosensitive resin composition for spacers comprises (a) a resin selected from the group consisting of (i) an alkali-soluble acrylate resin, (ii) a photopolymer resin and (iii) a mixture of these, (b) a urethane resin, (c) a crosslinkable monomer having at least two or more ethylenic double bonds, (d) a photopolymerization initiator and (e) a solvent.

Description

technical field [0001] The present invention relates to a photosensitive resin composition for a spacer, and more particularly to a photosensitive resin composition for a spacer as described below, which can not only reduce the occurrence of unfilled areas due to insufficient liquid crystal droplet Defective phenomenon, can prevent the damage caused by the pressure on the color filter, and can overcome the thickness deviation caused by the process, and because the ions and impurities will not dissolve into the liquid crystal, it will not reduce the voltage retention rate, and will not occur when the liquid crystal is aligned. At the same time, it is possible to form a spacer with excellent rubbing resistance, sufficient voltage retention and liquid crystal orientation, and excellent image development, high sensitivity, thermal stability, dimensional stability, and compressive strength. Background technique [0002] In liquid crystal panels and touch panels, spacer particles ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G02F1/13G02F1/1335
CPCG03F7/0007G03F7/004G03F7/027G03F7/028G03F7/031G03F7/032G03F7/033
Inventor 郑泽晟赵显一李仁喆朴京夏白圣勇朴赞硕
Owner DONGJIN SEMICHEM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com