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Light intensity modulation element, intensity-modulated-light generating device, laser exposure unit and photograph processing apparatus

A technology for modulating components and light intensity, which can be used in developing and printing devices, light control, instruments, etc. It can solve the problems of large size, difficulty in miniaturization of light intensity modulation components, long optical length, etc., and achieves adjustable light intensity and compact structure , to achieve the effect of conversion efficiency

Inactive Publication Date: 2006-01-18
NORITZ CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, the AOM used to modulate the intensity of light is a method that utilizes the diffraction of light. Therefore, in order to perform sufficient intensity modulation, and in consideration of the size used to distinguish and extract the diffracted light from the source light, it is necessary to make the optical length longer
Therefore, it is very difficult to miniaturize the light intensity modulation element made of AOM. In addition, various devices such as a photo processing device having the light intensity modulation element also inevitably require a larger size.

Method used

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  • Light intensity modulation element, intensity-modulated-light generating device, laser exposure unit and photograph processing apparatus
  • Light intensity modulation element, intensity-modulated-light generating device, laser exposure unit and photograph processing apparatus
  • Light intensity modulation element, intensity-modulated-light generating device, laser exposure unit and photograph processing apparatus

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Embodiment approach 1

[0074] image 3 (a) is a schematic diagram explaining one embodiment of the light intensity modulation element related to the present invention. in addition, image 3 (b) is a longitudinal sectional view illustrating a polarization structure in an embodiment of the light intensity modulation element related to the present invention, and is taken at image 3 (a) is a cross-sectional view of the center of the optical waveguide along the direction of the optical waveguide.

[0075] An optical waveguide 4 for guiding laser light is linearly formed in the central portion of the rectangular substrate 1 in the width direction. After that, the phase modulation electrodes 2 a and 2 b are provided so as to sandwich the optical waveguide 4 .

[0076] Substrate 1 is made of nonlinear optical crystal LiNbO 3 (LN: lithium niobate). The LiNbO 3 It is a ferroelectric crystal that exhibits a secondary nonlinear optical effect, and has the property of changing the refractive index when an...

Embodiment approach 2

[0108] In Embodiment 1 above, the light intensity modulation element 10 has two periodic polarization inversion parts and one non-polarization part, and the phase modulation is performed by the applied voltage in the non-polarization part, that is, the SH wave is performed. intensity modulation. In this embodiment, in addition to the structure of Embodiment 1, an optical intensity modulation element having a structure of one periodic polarization inversion portion and one non-polarization portion will be described. In addition, the newly added periodic polarization inversion part and non-polarization part are referred to as calibration parts according to needs.

[0109] Figure 5 It is a schematic diagram illustrating one embodiment of the light intensity modulation element related to the present invention. Portions assigned the same reference numerals as those in Embodiment 1 have the same functions and structures, and therefore description thereof will be omitted. In addi...

Embodiment approach 3

[0128] The optical intensity modulation elements 10 and 20 in Embodiments 1 and 2 above have a periodic polarization inversion portion and a non-polarization portion, and phase modulation can be performed by a voltage applied to the non-polarization portion, that is, SH Wave intensity modulation. In this embodiment, a laser light source including the light intensity modulation elements 10 and 20 , that is, an intensity modulation light generator will be described. The intensity modulated light generator, with figure 2 The combined functions of the laser light source 106 (or 108 ), the collimator lens 110 and the light intensity modulation element 112G (or 112B) in the shown laser exposure device.

[0129] Figure 7 It is a perspective view illustrating an embodiment of the intensity-modulated light generator L related to the present invention. The laser device L includes a laser generator 30 including a semiconductor laser 36 , and a light intensity modulation element 20 t...

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Abstract

The invention aims at providing a miniature light strength modulation element with high efficiency which can implement the strength modulation of lights that are transformed into second higher harmonics. An optical guided wave road in certain direction is formed on the main surface of a substrate which is made form nonlinear optical crystal. In the optical guided wave road, a polarized structure in the thickness direction of the substrate is formed in the optical guided wave road direction in a way that the polarities periodically and interactively reverse. Thus, in the optical guided wave road, a first and a second wavelength transforming parts which respectively transform part of emitted infrared lights into the second higher harmonics are formed. In addition, a first phase adjustment part which is equipped with a pair of relatively configured electrodes for clamping the optical guided wave road is formed between the first and the second wavelength transforming part.

Description

technical field [0001] The present invention relates to a light intensity modulating element for modulating the intensity of light emitted by a semiconductor laser, a wavelength conversion light generator with the light intensity modulation element and a semiconductor laser, a laser exposure device with the wavelength conversion light generator and This laser exposure apparatus was used as a photoprocessing apparatus of the exposure apparatus. Background technique [0002] In recent years, photo processing devices that expose image data captured by a digital camera or read by a scanner to photosensitive materials (photo paper) have been put into practical use. In addition, it is known that a laser exposure apparatus having a laser light source of red (R), green (G), and blue (B) visible light is used as an exposure apparatus of such a photograph processing apparatus. [0003] In the laser exposure apparatus, a semiconductor laser is used as a laser light source that outputs...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03B27/73G05D25/00G02F1/377
CPCG02F1/035G02F2201/16G02F1/3775G02F2202/20
Inventor 横尾雅一石井智之真野晃造兴雄司冈田龙雄
Owner NORITZ CORP
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