Preparation of photosensitive fluorine-containing poly(aryl ether) materials and use thereof

A technology of polyarylether and raw materials, which is applied in the field of polymer materials and its preparation, can solve problems affecting material properties, poor thermal expansion coefficient, high crosslinking temperature, etc., and achieve low dielectric constant, high thermal stability, and low light loss Effect

Inactive Publication Date: 2005-09-21
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the existence of acetylene groups, the crosslinking temperature is high, which will cause a large difference in thermal expansion coefficient between the film and the substrate during heat treatment, which will affect the performance of the material.

Method used

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  • Preparation of photosensitive fluorine-containing poly(aryl ether) materials and use thereof
  • Preparation of photosensitive fluorine-containing poly(aryl ether) materials and use thereof
  • Preparation of photosensitive fluorine-containing poly(aryl ether) materials and use thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Add 5.08 g (20 mmol) of m-trifluoromethylbenzene pendant hydroquinone (3F-PH) and 3.312 g of anhydrous potassium carbonate into a three-necked flask equipped with a stirring bar and a thermometer, and protect it from light and nitrogen. Add 49ml of N,N-dimethylacetamide (solid content 10%), stir the toluene until it is completely dissolved, then raise the temperature to 120°C with water for 2 hours, and the bisphenol will form a salt. After cooling to room temperature, add 0.388g (2mmol) of pentafluorostyrene, rapidly raise the temperature to 114°C for 20 minutes, and cool to room temperature; dissolve 6.346g (19mmol) of decafluorobiphenyl in 61ml of N,N-dimethylacetamide Add the reaction system, rapidly raise the temperature to 114°C and react for 20 minutes to obtain a linear polymer.

Embodiment 2

[0032] Add 5.08 g (20 mmol) of m-trifluoromethylbenzene pendant hydroquinone (3F-PH) and 3.312 g of anhydrous potassium carbonate into a three-necked flask equipped with a stirring bar and a thermometer, and protect it from light and nitrogen. Add 31ml of N,N-dimethylacetamide (15% solid content), stir the toluene until it is completely dissolved, then raise the temperature to 120°C with water for 2 hours, and the bisphenol will form a salt. After cooling to room temperature, add 0.388g (2mmol) of pentafluorostyrene, rapidly raise the temperature to 114°C for 20 minutes, and cool to room temperature; dissolve 6.346g (19mmol) of decafluorobiphenyl in 38ml of N,N-dimethylacetamide Add the reaction system, rapidly raise the temperature to 114°C and react for 20 minutes to obtain a linear polymer.

Embodiment 3

[0034] Add 5.08 g (20 mmol) of m-trifluoromethylbenzene pendant hydroquinone (3F-PH) and 3.312 g of anhydrous potassium carbonate into a three-necked flask equipped with a stirring bar and a thermometer, and protect it from light and nitrogen. Add 10ml of N,N-dimethylacetamide (solid content 35%), stir the toluene until it is completely dissolved, then raise the temperature to 120°C with water for 2 hours, and the bisphenol will form a salt. After cooling to room temperature, add 0.388g (2mmol) of pentafluorostyrene, rapidly raise the temperature to 114°C for 20 minutes, and cool to room temperature; dissolve 6.346g (19mmol) of decafluorobiphenyl in 13ml of N,N-dimethylacetamide Add the reaction system, rapidly raise the temperature to 114°C and react for 20 minutes to obtain a linear polymer.

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Abstract

The invention relates to a method for preparing the light-sensitive fluorine-containing polyarylether materials, which belongs to the field of polymer material and its preparation. The material names pentafluorostyrene terminated fluorine-containing polyarylether. The preparation process comprises: using the bisphenol monomers such as 3F-PH or (and) 6F-PH to finish the bisphenol salt process, then reacting with pentafluorostyrene in 10-25 min to finish the two steps condensation synthetic process, adding decafluorobiphenyl to react to 10-25 min, then getting through cooling filtration, boiling filtration and drying to get a linear polymer or random copolymer, thermal or ultraviolet crosslinking to get a thermosetting material in the crosslinking process. The degree of crosslinking of the said line polyarylether terminated using pentafluorostyrene is controlled by polymeric feed weight ratio and the exposure time. The product in the invention has the characteristic of high heat stability, low optical loss and low dielectric constant.

Description

technical field [0001] The invention belongs to the field of macromolecular materials and their preparation, and in particular relates to the synthesis and crosslinking technology of introducing a photosensitive group into a polyarylether system to prepare a photosensitive polymer with high fluorine content. Background technique [0002] In recent years, fluorine-containing polyarylethers have been widely used in the fields of optical communication and microelectronics due to their good light transmission, high mechanical strength, low moisture absorption and good processability. However, the processing technology of multi-layer coating requires that the material must be cross-linked to avoid mutual solubility between layers after processing. Among them, fluorine-containing polyarylethers terminated with phenylacetylene have been synthesized and developed to prepare several optical waveguide devices (such as arrayed waveguide gratings AWG). [0003] Phenylacetylene-terminat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G65/38G02B1/00
Inventor 姜振华李艾泽金宇辉王贵宾吴忠文
Owner JILIN UNIV
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