Apatite-containing film and production process therefor
A photocatalytic activity, apatite technology, used in catalyst activation/preparation, chemical instruments and methods, physical/chemical process catalysts, etc., can solve the difficulty of film formation thickness, insoluble apatite, no photocatalytic activity and transparency Apatite film, etc.
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[0072] Prepare the substrate
[0073] A 7.5 cm long, 5.5 cm wide and 1.1 mm thick glass piece (Corning 137 glass) was immersed in a washing solution diluted 5 times with Pure Soft PS (commercially available from As One Corporation). Following 30 minutes of sonication, the glass slides were rinsed with distilled water and dried. The dried glass sheet was dip-coated with NDH-500A (commercially available from Nippon Soda Co., Ltd.). Dip coating was performed at room temperature in a nitrogen atmosphere, and the coated panels were withdrawn at a rate of 24 cm / min. Immediately after the dip-coating step, each glass sheet was dried at 120 °C for 40 min and then fired at 500 °C for 30 min to form SiO 2 base coat. Repeat one more round of dip coating, drying and firing steps. The resulting loaded SiO 2 A glass slide was used as the substrate.
[0074] Preparation of apatite film
[0075] Calcium nitrate tetrahydrate [Ca(NO 3 ) 2 4H 2 0, 2.125 g], and the resulting mixture wa...
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