Digital shape spliting mask prodn. method for microoptical element
A manufacturing method and micro-optics technology, applied in optics, micro-lithography exposure equipment, originals for photomechanical processing, etc., can solve the problems of gray-scale mask edge sharpness decline, etc., to improve edge sharpness, avoid The effect of different flipping frequencies and reducing difficulty
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0024] A digital fractal mask manufacturing method for a digital micromirror device high-frequency grayscale mask pattern:
[0025] (1) Sampling by a fixed low-frequency period, the low-frequency sampling period is twice the minimum period of the original high-frequency mask pattern, thereby decomposing a high-frequency mask pattern into two low-frequency masks of equal size;
[0026] (2) Align and superimpose the two low-frequency masks along the direction perpendicular to the plane where the masks are located, and the sum of the gray value of the corresponding position after the superimposition is equal to the gray value of the corresponding position of the original high-frequency mask;
[0027] (3) Through the real-time mask technology, the two low-frequency masks are sequentially exposed, and the exposure time of each is 1 / 2 of the exposure time of the original mask, thereby recovering the original high-frequency mask pattern.
Embodiment 2
[0029] A digital fractal mask manufacturing method for a digital micromirror device high-frequency grayscale mask pattern:
[0030] (1) Sampling by a fixed low-frequency period, the low-frequency sampling period is three times the minimum period of the original high-frequency mask pattern, thereby decomposing a high-frequency mask pattern into three low-frequency masks of equal size;
[0031] (2) Align and superimpose these 3 low-frequency masks along the direction perpendicular to the plane where the masks are located, and the sum of the gray value of the corresponding position after the superimposition is equal to the gray value of the corresponding position of the original high-frequency mask;
[0032] (3) Through the real-time mask technology, the three low-frequency masks are sequentially exposed, and the exposure time of each is 1 / 3 of the exposure time of the original mask, so as to restore the original high-frequency mask pattern.
Embodiment 3
[0034] A digital fractal mask manufacturing method for an eight-step grayscale mask pattern of a digital micromirror device:
[0035] (1) directly according to the step number 8 fractal, the quantity of the fractal low-frequency mask is the step number 8, thereby decomposing a high-frequency mask figure into step number 8 equal-sized low-frequency masks;
[0036] (2) Align and superimpose these 8 low-frequency masks along the direction perpendicular to the plane where the mask is located, and the gray value of the corresponding position after superimposition is equal to the gray value of the corresponding position of the original high-frequency mask;
[0037] (3) Through the real-time mask technology, the eight low-frequency masks are sequentially exposed, and the exposure time of each is 1 / 8 of the exposure time of the original mask, thereby recovering the original high-frequency mask pattern.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com