Liquid crystal display device with pixel of small leakage current
A liquid crystal display device, pixel technology, applied in static indicators, cathode ray tube indicators, optics, etc., can solve problems such as increased voltage stress, reliability of insulating film, difficulty in suppressing leakage current, etc. effects of stress, improved retention characteristics, and improved operational reliability
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Embodiment 1
[0023] (Overall structure of liquid crystal display device)
[0024] Firstly, the overall structure of the liquid crystal display device according to the embodiment of the present invention will be described.
[0025] refer to figure 1 , the liquid crystal display device 5 of the present invention includes a liquid crystal array portion 20 , a gate driving circuit 30 and a source driving circuit 40 . The liquid crystal array section 20 includes a plurality of pixels 10 arranged in rows and columns. The first gate line GL and the second gate line GL# are arranged respectively corresponding to the row of pixels (hereinafter also referred to as “pixel row”). The data lines DL are provided corresponding to columns of pixels (hereinafter also referred to as “pixel columns”). figure 1 , representatively show the pixels in the first column and the second column of the first row, and the corresponding gate lines GL1, GL1# and data lines DL1, DL2.
[0026] In order to set each gate...
Embodiment 2
[0121] Figure 7 It is an equivalent circuit diagram showing an example of the pixel structure of the second embodiment.
[0122] exist figure 1 shown in the general diagram Figure 7 The pixel 11 shown can be used instead of the pixel 10 .
[0123] refer to Figure 7 , the pixel 11 of embodiment 2 and Figure 6 Compared with the pixel 10 of the first embodiment shown, the difference lies in that the holding capacitor 14 is connected between the pixel electrode node Np and the counter electrode node Nc. Additionally, with image 3 Similarly, the common voltage VCOM of the counter electrode node Nc is supplied as an AC voltage with an amplitude VD alternately set to the low voltage VCOML or the high voltage VCOMH at a predetermined cycle. Pixel 11 is in image 3 The pixel 11# of the shown comparative example is configured by adding an N-type TFT element 19 .
[0124] and Figure 4Like the pixel 10 shown, the gates of the N-type TFT elements 16 and 18 are connected to t...
Embodiment 3
[0146] In Embodiment 1 and Embodiment 2, it was explained that by providing a TFT element whose gate voltage is set to an intermediate voltage VGM in a non-selected state in the leakage current path, it is possible to suppress the leakage current and protect the gate insulating film of the TFT element at the same time. pixel structure.
[0147] However, although this is an ideal structure from the viewpoint of protecting the TFT element during normal operation, it cannot be used in the accelerated test (burn-in test) for intentionally applying a stress greater than normal operation to identify defects. Apply the desired stress to the component. In this burn-in test, the test is carried out under stricter conditions than the normal operation, that is, the operation test is performed by applying high temperature and large voltage stress for a predetermined time. Therefore, in order to conduct efficient tests, it is best to use a A structure that provides sufficient voltage stre...
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