Method for preparing rare earth alloy through sweeping electric potential sedimentation

A rare earth alloy and deposition method, applied in the field of rare earth alloy preparation, can solve the problems of inability to precipitate on the substrate, rough adhesion of the alloy film, poor performance of the alloy film, etc., and achieve huge potential economic and social benefits. The effect of improving performance

Inactive Publication Date: 2004-03-10
SUN YAT SEN UNIV
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  • Abstract
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AI Technical Summary

Problems solved by technology

When using the constant potential method and constant current method to deposit, the electrode reaction is controlled by the ion diffusion rate in the bulk solution, so the alloy film produced in this way is often rough and has poor adhesion; the use of pulse electrodeposition has the disadvantage of low efficiency.
[0003] Due to the relatively negative reduction potential of rare earths, the precipitation of hydrogen is prone to occur during the electrodeposition of rare earth-iron group alloys in aqueous solution, resulting in poor performance of the alloy film or failure to precipitate on the substrate. Even adding an appropriate complexing agent cannot fundamentally overcome this problem. These disadvantages

Method used

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  • Method for preparing rare earth alloy through sweeping electric potential sedimentation
  • Method for preparing rare earth alloy through sweeping electric potential sedimentation
  • Method for preparing rare earth alloy through sweeping electric potential sedimentation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] Table 1 shows the composition, content ratio and operating conditions of the plating solutions of Examples 1-15 of the present invention.

[0028] Reality

Shi

example

The concentration of each component in the plating solution (g L -1 )

operating conditions

Dysprosium nitrate

Terbium nitrate

Thulium nitrate

Europium nitrate

tartaric acid

citric acid

nickel chloride

Cobalt chloride

Ferrous chloride

scanning speed

(mV / s)

time

(min)

1

15

15

10.6

10

15

2

20

10.6

5

15

3

30

20

2

15

4

15

20

10.6

100

15

5

25

19.2

10.6

10

15

6

15

6.5

...

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Abstract

A process for preparing RE alloy in organic solvent by scan potentia deposition method includes preparing the plating liquid from dimethyl sulfoxide (or formamide) as solvent, RE nitrate and Fe-series chloride as main salt and tartaric acid or citric acid as complexing agent, pretreating the basic metal body, and plating said basic metal body in said plating liquid at 18-35 deg.C and 2-100 mv / s of scan speed for 10-35 min to generate RE alloy film on the basic metal body. Its advantages are high uniformity, compectness and adhesion of film, and nano-class granularity.

Description

technical field [0001] The invention relates to a method for preparing rare earth alloys in an organic solvent by means of a scanning potential deposition method. Background technique [0002] The metal alloy film can be widely used in hydrogen storage alloys, magneto-optical recording media and magnetostrictive materials. At present, the electrochemical preparation methods of these alloy films are mainly constant potential, constant current and pulse electrodeposition. The electrode reaction is controlled by the ion diffusion rate in the bulk solution when the constant potential method and the constant current method are used for deposition, so the alloy film produced in this way is often rough and has poor adhesion; the pulse electrodeposition has the disadvantage of low efficiency. [0003] Due to the relatively negative reduction potential of rare earths, the precipitation of hydrogen is prone to occur during the electrodeposition of rare earth-iron group alloys in aque...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/56C25D5/18
Inventor 刘冠昆何凤荣袁定胜黄开胜
Owner SUN YAT SEN UNIV
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