Semiconductor memory unit and array using ultra-thin medium breakdown phenomenon
A technology for memory cells and memory arrays, applied in the field of non-volatile programmable semiconductor memory cells and memory arrays, can solve problems such as breakdown of gated diodes, and achieve the effects of improving integration density, reducing manufacturing costs, and shortening development time.
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[0072] A semiconductor memory cell with a data storage element formed around an ultra-thin medium (such as a gate oxide layer) is used to store information. The operation method is to stress the ultra-thin medium to cause breakdown (soft breakdown or hard breakdown) ) To establish the leakage current level of the memory cell. The memory cell is read by detecting the current absorbed by the cell. A suitable ultra-thin dielectric is, for example, a high-quality gate oxide layer with a thickness of about 50 angstroms or less. This kind of ultra-thin oxide dielectric is usually used in today's advanced CMOS logic processes. The usual methods for forming this oxide layer include deposition, oxygen growth of silicon active regions, or a combination thereof. Other suitable dielectrics include oxide-nitride-oxide composite dielectrics, compound oxides and so on.
[0073]The following description gives a lot of specific details in order to have a thorough understanding of the present inven...
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