Surface passivation method for nuclear detector tellurium-zinc-cadmium wafer
A cadmium zinc telluride wafer and nuclear detector technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., to achieve the effect of improving electrical performance
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[0012] Embodiment one: the technological process of the present embodiment comprises following each procedure,
[0013] a. Polishing of CZT crystal: the cut size is 5×5×2mm 3 The CZT wafers were rough-polished with corundum to make the surface smooth; after rough polishing, the wafers were cleaned, put into a beaker filled with deionized water and oscillated for 5 minutes to remove surface contaminants and Impurity particles, and then finely polish the CZT wafer with corundum micropowder polishing liquid with a particle size of 1um, 0.5um, and 0.2um on the grinder until the surface of the wafer is mirror-like. After fine polishing, the surface impurities are removed by ultrasonic vibration again, and the wafer is immersed in anhydrous methanol to be etched.
[0014] b. Wafer surface corrosion: The polished CZT wafer is first chemically etched with BM corrosion solution (5% Br+methanol) for 1 minute; the wafer corroded by BM corrosion solution is rinsed in methanol before usin...
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