Binary optica device grey scale changing mask method and device for making
A technology of gray scale mask and binary optics, which is applied in the direction of photolithographic process exposure device, optics, and originals for photomechanical processing, etc., can solve the problems of high cost and complicated process, and achieve high Contrast characteristics, effects for precise control
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[0033] The key to the variable grayscale mask method is that it is difficult to quickly produce a high-precision grayscale mask with different grayscale levels to precisely control the exposure. The invention proposes a grayscale mask manufacturing method based on a spatial light modulator, which adopts pattern-by-pattern exposure, which can overcome the shortcomings of slow speed and high cost of direct writing grayscale masks by lasers and electron beams, and at the same time utilizes the high Features such as resolution, high gray scale number and high contrast can make the minimum feature size of the gray scale reticle reach the micron or even sub-micron level. The present invention is characterized in that it connects the spatial light modulator with the computer through the video driver, and the computer controls and inputs the video signal, the light beam emitted by the point light source becomes parallel light after passing through the condenser lens, and the vertical i...
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