Nano twin crystal copper material with ultrahigh strength and superhigh conductivity as well as preparation method
A nano-twinned copper, ultra-high-strength technology, used in ultra-high conductivity nano-twinned copper materials and preparation, ultra-high strength field, can solve the problems of limited yield strength of pure Cu materials, and achieve excellent properties and high conductivity. , high-strength effect
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Embodiment 1
[0030] 1. Preparation of flaky nano-twin crystal Cu material by electrolytic deposition technology
[0031] Electrolytic deposition equipment: single pulse electrolytic deposition equipment
[0032] Electrolyte requirements for electrolytic deposition: electronically pure CuSO 4 Solution, strictly control the content of heavy metal impurities in the electrolyte, the water used for distributing the electrolyte should be high-purity deionized water, and the acidity of the electrolyte is: PH=1.
[0033] Requirements for cathode and anode: the anode is a pure copper plate with a purity higher than 99.99%, and the cathode is an iron plate coated with Ni-P amorphous layer.
[0034] 2. Electrolysis process parameters: pulse current density is 50A / cm 2 , pulse plating; conduction time (t on ) is 0.02s, closing time (t off ) for 2s, the distance between the cathode and the anode is 100mm, the area ratio of the anode and the cathode is 50:1; the electrolysis temperature is 20°C, and...
Embodiment 2
[0042] The difference from Example 1 is:
[0043] 1) Preparation of flaky nanocrystalline Cu materials by electrolytic deposition technology: Electron-grade high-purity copper sulfate CuSO for electrolyte 4 solution, add high-purity distilled water, and the acidity is PH=0.5; cathode and anode: the anode is a pure copper plate with a purity higher than 99.99%, and the cathode is an iron plate coated with a Ni-P amorphous layer on the surface, and the anode-cathode area ratio is 30 : 1.
[0044] 2) Additives: 0.02ml / l of gelatin aqueous solution with 5% concentration, 0.2ml / l of high-purity NaCl aqueous solution with 5% concentration; electrolysis process parameters: pulse current density is 80A / cm 2 , on-time (t on ) is 0.05s, the closing time (t off ) is 3s; the distance between cathode and anode is 50mm, and the temperature of electrolyte is 15℃;
[0045] High-purity, high-density, thin-sheet twinned nanocrystalline Cu materials can also be prepared under this process co...
Embodiment 3
[0047] The difference from Example 1 is:
[0048] 1) Preparation of thin flaky nanocrystalline Cu materials by electrolytic deposition technology: electronically pure copper sulfate CuSO for electrolyte 4 solution, add high-purity distilled water, the acidity is PH=1.5; cathode and anode: the anode is a pure copper plate with a purity higher than 99.99%, and the cathode is a low-carbon steel plate coated with a Ni-P amorphous layer on the surface, and the anode-cathode area ratio is 40 : 1.
[0049] 2) Additives: 0.15ml / l of gelatin aqueous solution with 25% concentration, 1.0ml / l of high-purity NaCl aqueous solution with 25% concentration; electrolysis process parameters: pulse current density is 40A / cm 2 , on-time (t on ) is 0.01s, closing time (t off ) is 1s; the pole distance between cathode and anode is 150mm, and the electrolysis temperature is 25°C;
[0050] Under the process conditions, high-purity, high-density, thin-sheet twinned nanocrystalline Cu materials can ...
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