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Silicon tetrachloride hydrogenating process of producing trichloro hydrosilicon

A technology of trichlorosilane and silicon tetrachloride, which is applied in the direction of silicon halides, silicon hydrides, halosilanes, etc., can solve the problems of high reaction conversion conditions, low copper salt catalyst activity, and low primary conversion rate, etc., to achieve The effect of high primary conversion rate, easy handling of equipment and low unit consumption

Inactive Publication Date: 2005-01-05
CHINA ENFI ENG CO LTD
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  • Abstract
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AI Technical Summary

Problems solved by technology

[0008] 1. The ratio of HCl or CuCl, nickel salt, copper salt and other catalysts to silicon powder is generally 5%, and the primary conversion rate is low, generally 15-18%, so the consumption of raw materials is high and the production efficiency is low
[0009] 2. HCl, CuCl, and granular nickel salts and copper salts have low catalyst activity and require high reaction conversion conditions. The pressure is 2.1-3.5 MPa and the temperature is 500 ° C. Therefore, the energy consumption of the process is high, and the material and structure of the reactor are high and complex.

Method used

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  • Silicon tetrachloride hydrogenating process of producing trichloro hydrosilicon

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Embodiment Construction

[0028] see figure 1 In this embodiment, the powdered hydrogenation nickel catalyst and silicon powder are evenly mixed in proportion and placed in the activator 1 for activation. The fully activated mixture can be used for hydrogenation reaction and continuous supplementation of the process. SiCl 4 Liquid phase temperature keeps temperature and gas phase total pressure in storage tank 2; Catalyst and silicon powder mixed material layer after activation treatment in hydrogenation reactor 3 pass through H 2 with SiCl 4 Mixed gas; SiHCl can be obtained in the mixed gas leaving the mixed material layer 3 . After the mixed gas at the outlet of the hydrogenation reactor 3 is dedusted and filtered by the dust collector 4, the chlorosilane is separated in a liquid state in the condenser 5, and the non-condensable H 2 The gas is returned to the storage tank 2 for recycling. After the liquid chlorosilane is fractionated by the fractionating tower 6, the light component SiHCl 3 Inc...

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Abstract

The silicon tetrachloride hydrogenating process of producing trichloro-hydrosilicon includes: mixing powdered nickel catalyst and silicon powder in the mass ratio of 1-10 and activating the mixture in hydrogen atmosphere and at the temperature of continuously change from 20 deg.C to 420 deg.c; and making mixed gas of hydrogen and SiCl4 in the molar ratio of 1-10 pass through the activated catalyst and silicon powder layer for hydrogenating SiCl4 continuously at 400-500 deg.c temperature and 1.2-1.5 MPa pressure. The equipment, system and operation of the present invention has high once SiCl4 converting rate and low power consumption and may be used in large-scale production.

Description

technical field [0001] The invention belongs to the technology of hydrogenating silicon tetrachloride to produce trichlorosilane. Background technique [0002] At present, polysilicon factories using Siemens technology at home and abroad use silicon powder and hydrogen chloride to synthesize SiHCl 3 . Among the synthesized products, SiHCl 3 About 80%, SiCl 4 About 20%. After the synthesis gas condensate passes crude distillation and rectification, SiCl 4 Separated as impurities, SiHCl 3 It is used to produce polysilicon. [0003] in SiHCl 3 In the process of reducing and decomposing high-purity polysilicon products under the atmospheric conditions of about 1100 ° C, SiCl is produced per ton of products 4 Nearly 6 tons. Therefore, the by-product SiCl per ton of polysilicon products of a polysilicon plant that generally adopts the Siemens process 4 Nearly 10 tons must be recycled, otherwise it is impossible to implement large-scale production of polysilicon products....

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/04C01B33/08C01B33/107
Inventor 沈祖祥毋克力严大洲刘建军汤传斌
Owner CHINA ENFI ENG CO LTD
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