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Flexible film high-uniformity contact type alignment exposure device

A flexible film and exposure device technology, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problems of flexible film deformation, achieve the effects of reducing deformation, improving exposure resolution, and simple and reliable structure

Pending Publication Date: 2022-08-09
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The technical problem to be solved by the present invention is: to overcome the problem of deformation of the flexible film in the traditional technology, and to realize the production of large-diameter and high-precision flexible film micro-nano structure optical elements. The present invention provides a flexible film high-uniform contact alignment exposure device

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  • Flexible film high-uniformity contact type alignment exposure device
  • Flexible film high-uniformity contact type alignment exposure device

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Embodiment Construction

[0020] The following is combined with the attachment and the specific embodiments to further illustrate the present invention.

[0021] A flexible film high -uniform contact exposure device is a flexible film, which includes cavity skeleton 1, pumping air channel 1A, cable channel 1B, vacuum sealing parts 1C, vibration base 2. Optical window 3. Positioning sales 3A, 3A Light mask version 4. Covering the membrane positioning mark 4A, mask fixation 4B, flexible film 5, film positioning mark 5A, film bracket 5B, six free degree platform 6, pressure ring bracket 7, flexible pressure ring 7A, lifting mechanism 7B, rotating mechanism 7C, universal section 7D, microscopic displacement 8 and microscope 9. The connection relationship is the cavity skeleton 1 and the vibration base 2 connection to form a vacuum cavity. The six -freedom platform 6 and the 7B of the lifting mechanism are connected with the cavity skeleton 1. Optical window 3 is embedded in the vibration base 2 pairs of light ...

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Abstract

The invention provides a flexible film high-uniformity contact type alignment exposure device. The flexible film high-uniformity contact type alignment exposure device comprises a cavity framework, a vibration isolation base, an optical window, a photomask, a flexible film, a six-degree-of-freedom platform, a pressing ring support, a flexible pressing ring, a lifting mechanism, a rotating mechanism, a universal joint, a microscope displacement table and a microscope. The cavity framework and the vibration isolation base are connected to form a vacuum cavity, and the six-degree-of-freedom platform and the lifting mechanism are both connected with the cavity framework. The optical window is embedded in the vibration isolation base to support the photomask. And the flexible film is supported by the film bracket and is connected with the six-degree-of-freedom platform. The pressing ring support is upwards connected with the universal joint, the rotating mechanism and the lifting mechanism in sequence and downwards connected with the flexible pressing ring. The microscope is connected with the pressing ring support through the microscope displacement table. According to the invention, non-uniform air gaps of a traditional contact type photoetching machine are reduced, and the exposure resolution is improved; deformation of the thin film caused by a traditional vacuum attaching method is reduced, and the alignment and overlay precision is improved.

Description

Technical field [0001] The invention is a field of optical micro -processing, which is specific to a flexible thin film high and uniform contact exposure device. Background technique [0002] In the contact exposure process of a flexible thin film micro -nano -nano -nano structure, because the flexible thin film facial shape cannot be matched with the light mask, generally there are at least micron -oriented facial shape errors, and the error amount gradually increases with the caliber, resulting in the substrate film The micrometer magnitude of the micron is not uniform air gap between the mask, reducing the resolution of the photocal. Although the method of traditional vacuum stickers can eliminate the air gap, it cannot meet the requirements of the sedimentation accuracy at the cost of flexible film deformation. Invention content [0003] The technical problem to be solved by the present invention is to overcome the problem of flexible film deformation of traditional technolo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70808G03F7/70866
Inventor 高国涵杜俊峰边疆范斌雷柏平吴时彬刘鑫汪利华石恒杨虎
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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