Waste gas treatment device for polycrystalline silicon preparation and use method of waste gas treatment device
A waste gas treatment device and polysilicon preparation technology, applied in the direction of separation methods, feeding devices, chemical instruments and methods, etc., can solve the problem of filter blockage, poor purification of waste gas, and poor recovery of waste gas heat Use and other problems to achieve the effect of reducing heat loss and reducing workload
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[0029] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0030] see Figure 1-5 , the present invention provides a technical solution: a waste gas treatment device for polycrystalline silicon preparation, comprising an installation frame 1 and a bracket 2 fixed on the top of the installation frame 1, a reaction furnace 3 is fixedly installed on the bracket 2, and the top of the reaction furnace 3 is connected There is an exhaust pipe 4, and a heat recovery tank 5, a filter tank 6, and a pur...
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