Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Method for maintaining quartz boat

A quartz boat and deposition process technology, used in coatings, gaseous chemical plating, semiconductor devices, etc., can solve problems such as reducing the life of the quartz boat, reduce the probability of cracks or fractures, avoid stress conditions, and reduce stress.

Pending Publication Date: 2022-05-10
LONGI SOLAR TECH (XIAN) CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The temperature must be lowered during this process, otherwise the silicon wafer cannot be loaded and unloaded, and the stress of the silicon film on the surface of the quartz boat will act on the quartz boat during the cooling process, thereby greatly reducing the life of the quartz boat

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for maintaining quartz boat
  • Method for maintaining quartz boat
  • Method for maintaining quartz boat

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] Specific embodiments of the present disclosure will be described in detail below. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present disclosure, but not to limit the present disclosure.

[0024] The present disclosure provides a method for maintaining a quartz boat, the method comprising:

[0025] The quartz boat loaded with the parts to be plated is subjected to the deposition process of the silicon film on the surface of the parts to be plated. Under the condition that the temperature of the quartz boat after the deposition process does not drop to room temperature, the The maintenance process of the quartz boat is carried out, and the maintenance process includes high temperature oxidation treatment.

[0026] In the present disclosure, the surface silicon in the silicon film deposited on the surface of the quartz boat is oxidized into silicon oxide by adding maintenance steps after the silicon f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a quartz boat maintenance method which comprises the following steps: performing a deposition process of a silicon film on the surface of a to-be-plated part on a quartz boat loaded with the to-be-plated part, and directly performing a maintenance process on the quartz boat after the deposition process under the condition that the temperature of the quartz boat after the deposition process is not reduced to room temperature, the maintenance process comprises high-temperature oxidation treatment. According to the method disclosed by the invention, the silicon part on the surface of the silicon film deposited on the surface of the quartz boat can be oxidized into silicon oxide, so that the stress borne by the quartz boat is reduced, and the probability of cracks or fractures of the quartz boat is further reduced. And meanwhile, a long-time cooling step does not exist between the deposition process and the maintenance process, that is, the temperature of the quartz boat cannot be greatly reduced, so that the stress condition caused by large temperature change is avoided.

Description

technical field [0001] The present disclosure relates to the field of photovoltaics, and in particular, to a maintenance method for a quartz boat. Background technique [0002] In the current high-efficiency solar cell structure, a passivation contact structure is often used, and the passivation contact structure is usually composed of an interface passivation layer and a doped semiconductor thin film. In the deposition process of the semiconductor layer film, a carrier is usually used to carry the part to be plated. In the current industrialization process, in most cases, quartz boats are used as semiconductor thin film carriers. [0003] During the repeated use of the quartz boat carrier, the semiconductor film in the non-process area on the surface of the quartz boat will gradually thicken. Due to the huge difference between the thermal expansion coefficient of the deposited polycrystalline silicon, microcrystalline silicon, nanocrystalline silicon or amorphous silicon ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/458C23C16/24H01L31/18
CPCC23C16/44C23C16/458C23C16/24H01L31/1868Y02P70/50
Inventor 朱广东李华靳玉鹏
Owner LONGI SOLAR TECH (XIAN) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com