Lithography machine energy detection device and detection method

Abstract

The invention belongs to the field of energy detection, and discloses a photoetching machine energy detection device and method, the device comprises a mounting plate, the mounting plate is fixedly mounted in a photoetching machine movement mechanism, two guide rails are transversely and fixedly arranged on the front end face of the mounting plate, and a servo motor is fixedly arranged on one side of the mounting plate; the servo motor drives a mounting base through a synchronous wheel and a synchronous belt, and the mounting base is arranged between the two guide rails in a sliding mode through a sliding block. Through cooperative use of the CCD and the energy probe, energy detection which is accurate to a pixel point is carried out on the emergent light of the photoetching machine, so that more accurate detection on the emergent light energy uniformity of the photoetching machine is facilitated, the exposure precision of the photoetching machine is effectively improved, and a measurement error caused by aging of an attenuation sheet is prevented; through the use of the attenuation sheet, the detectable energy range of the CCD is effectively improved, through the use of the synchronous belt, the weight of the energy detection device is effectively reduced, and the deformation of a motion mechanism is effectively reduced.

Description

technical field [0001] The invention belongs to the technical field of energy detection, and in particular relates to an energy detection device and a detection method for a photolithography machine. Background technique [0002] Lithography machine, also known as exposure machine, exposure system, lithography system, etc., is the core device for manufacturing chips. It draws graphics on the substrate by controlling light. In the process of drawing graphics, the uniformity of light intensity will affect the later process. The etching effect in the lithography machine will affect the lithography accuracy of the lithography machine, and the price of the substrate is relatively expensive, and the scrapping of the substrate will cause large property losses. Therefore, it is necessary to detect the light uniformity of the lithography machine. [0003] The existing lithography machine energy detection device mainly detects the uniformity through the energy probe. There may be reg...

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Problems solved by technology

[0002] Lithography machine, also known as exposure machine, exposure system, lithography system, etc., is the core device for manufacturing chips. It draws graphics on the substrate by controlling light. In the process of drawing graphics, the uniformity of light intensity will affect the later process. The etching effect in the lithography machine will affect the lithography accuracy of the lithography machine, and the price of the substrate is relatively expensive, and the scrapping of the substrate will cause large property losses. Therefore, it is necessary to detect the light uniformity of the lithography machine

[0003] The existing lithography machine energy detection device mainly detects the uniformity through the energy probe. There may be regional substandard light output, which will affect the exposure effect of the lithography machine, which will lead to an increase in the probability of substrate scrapping; and the maximum gray value of the CCD spot is 255. When the spot is too bright, the gray value of the CCD will If it is greater than 255, the CCD will appear oversaturation cut-off phenomenon; the driving mechanism of the existing lithography machine energy detection device is mostly the direct drive of the screw rod with the servo motor or the linear motor. These two methods are heavy and will cause movement. There will be a large deformation at the energy detection device in the mechanism, which will affect the accuracy of the lithography machine, and the attenuation sheet will have attenuation of the pass rate under the irradiation of strong light

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