Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multilayer-structure super-hydrophobic surface capable of resisting condensation failure under photo-thermal condition and preparation method of multilayer-structure super-hydrophobic surface

A super-hydrophobic surface and multi-layer structure technology, applied to special surfaces, devices for coating liquid on the surface, coatings, etc., to achieve strong light-harvesting performance, superior light-reflecting performance, and small gaps

Active Publication Date: 2022-03-25
UNIV OF ELECTRONICS SCI & TECH OF CHINA +2
View PDF11 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, how to obtain an ideal photothermal material that is cheap, easy to prepare, and has high photothermal efficiency is a difficult problem.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multilayer-structure super-hydrophobic surface capable of resisting condensation failure under photo-thermal condition and preparation method of multilayer-structure super-hydrophobic surface
  • Multilayer-structure super-hydrophobic surface capable of resisting condensation failure under photo-thermal condition and preparation method of multilayer-structure super-hydrophobic surface
  • Multilayer-structure super-hydrophobic surface capable of resisting condensation failure under photo-thermal condition and preparation method of multilayer-structure super-hydrophobic surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] This embodiment provides a method for preparing a superhydrophobic surface with a multilayer structure capable of photothermal anti-condensation failure, including the following steps:

[0048] (1) Drop coating energy storage layer

[0049] Na 2 SO 4 10H 2 O was mixed with absolute ethanol, prepared into a suspension at a mass concentration of 500 mg / mL, and dripped with a plastic dropper. The suspension was covered with the entire silicon wafer and placed flat on the table. After standing at room temperature for 6 hours, the energy storage layer was obtained.

[0050] (2) drop coating reflective layer

[0051] Mix solid silica spheres with a particle size of 300nm and absolute ethanol, prepare a suspension at a mass concentration of 30mg / mL, drop it with a plastic dropper, cover the entire energy storage layer with the suspension, and place it flat on the table. Place it at room temperature for 6h to obtain a white silicon dioxide reflective layer.

[0052] (3) Dr...

Embodiment 2

[0058] This embodiment provides a method for preparing a superhydrophobic surface with a multilayer structure capable of photothermal anti-condensation failure, including the following steps:

[0059] (1) Spraying the energy storage layer

[0060] Na 2 SO 4 10H 2 O was mixed with absolute ethanol, prepared as a suspension at a mass concentration of 400 mg / mL, and sprayed onto half the surface of the silicon wafer at a spray speed of 50 mL / min by a pneumatic spraying equipment to obtain an energy storage layer.

[0061] (2) Spray double reflective layer

[0062] Mix solid silica spheres with a particle size of 500nm and absolute ethanol, prepare a suspension at a mass concentration of 50mg / mL, and spray it onto the surface of the energy storage layer at a spray speed of 50mL / min using a pneumatic spraying equipment to obtain a layer Silica material surface. Then mix solid silica spheres with a particle size of 100nm and absolute ethanol, prepare a suspension at a mass conc...

Embodiment 3

[0069] This embodiment provides a method for preparing a superhydrophobic surface with a multilayer structure capable of photothermal anti-condensation failure, including the following steps:

[0070] (1) Drop coating energy storage layer

[0071] CaCl 2 ·6H 2 O was mixed with absolute ethanol, prepared into a suspension with a mass concentration of 200 mg / mL, and dripped with a plastic dropper. The suspension was covered with the entire silicon wafer and placed flat on the table. After standing at room temperature for 6 hours, the energy storage layer was obtained.

[0072] (2) Spray reflective layer

[0073] Mix solid silica spheres with a particle size of 300nm and absolute ethanol, prepare a suspension at a mass concentration of 30mg / mL, and spray it onto the surface of the energy storage layer at a spray speed of 50mL / min using a pneumatic spraying equipment to obtain a reflective layer surface.

[0074] (3) Spray light-absorbing layer

[0075] Mix carboxylated multi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
concentrationaaaaaaaaaa
lengthaaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a super-hydrophobic surface of a multi-layer structure capable of photo-thermal condensation failure resistance and a preparation method thereof.The super-hydrophobic surface sequentially comprises a substrate, an energy storage layer, a reflecting layer and a light absorption layer from bottom to top, the energy storage layer can store daytime illumination energy and keep the material surface at a high temperature at night, the supercooling degree of the surface is reduced, and the light absorption layer can absorb light from the substrate to the reflecting layer; the reflecting layer is made of a single-layer or multi-layer white material, the light absorbing layer is made of a light absorbing material, the layers can be combined by a dispensing method or a direct spraying method, and finally the super-hydrophobic surface with the multi-layer structure and the photothermal effect is prepared. According to the super-hydrophobic surface disclosed by the invention, the condensation failure resistance can be realized by utilizing good photo-thermal capacity, the long-acting stability of the self-cleaning performance is kept, and the super-hydrophobic surface has the advantages of high cost and high efficiency.

Description

technical field [0001] The invention belongs to the technical field of super-hydrophobic materials, and in particular relates to a multi-layer super-hydrophobic surface capable of photothermal anti-condensation failure and a preparation method thereof. Background technique [0002] As a material with strong anti-wetting ability, superhydrophobic surface exhibits multiple functions such as self-cleaning, keeping dry, drag reduction, liquid resistance and breathability, and has broad application prospects in industrial and biomedical fields. However, when the superhydrophobic surface is used in an outdoor environment, in the face of an environment with high humidity and high temperature difference, gas-liquid condensation often occurs on the surface. Gas-liquid condensation is a very common phenomenon in daily life, such as the water film on the indoor windows in winter, the water droplets on the pot cover when cooking soup, the dew on the leaves in the morning, etc., and it i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B05D1/02B05D1/26B05D5/00B05D7/00C09D5/33C09D5/32
CPCB05D1/02B05D1/26B05D5/00B05D7/56C09D5/004C09D5/32
Inventor 章伟邓旭王德辉周昱
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com