Method for regulating and controlling particle size of porous silicon nanoparticles

A nanoparticle and porous silicon technology, applied in nanotechnology, nanotechnology, chemical instruments and methods, etc., can solve the problems of large particle size, poor dispersion, wide particle size distribution of porous silicon, etc., to achieve uniform particle distribution, average The effect of small particle size and high application rate

Pending Publication Date: 2022-02-18
NANJING COLLEGE OF INFORMATION TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the size distribution of porous silicon particles obtained by this method is relatively wide, which does not meet the requirements of cell interaction experiments. Untreated porous silicon has the disadvantages of large and uneven particle size, poor dispersion in liquid, and small specific surface area.

Method used

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  • Method for regulating and controlling particle size of porous silicon nanoparticles
  • Method for regulating and controlling particle size of porous silicon nanoparticles
  • Method for regulating and controlling particle size of porous silicon nanoparticles

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Embodiment 1

[0036] A method for regulating the particle size of porous silicon nanoparticles, comprising the steps of:

[0037] (1) Pretreatment of silicon wafers: first cut the silicon wafers into rectangles of about 1.5×1.5cm, prepare a solution with a volume ratio of concentrated sulfuric acid (98%):hydrogen peroxide=3:1, and put the cut rectangular silicon wafers into In the solution, immerse and heat for 15 minutes under the condition of 80°C water bath, the purpose is to remove the organic pollutants on the surface of the silicon wafer. Afterwards, rinse the silicon wafer repeatedly with a large amount of deionized water until the residual liquid after the last rinse is neutral, and store the silicon wafer in deionized water for later use;

[0038] (2) Preparation of porous silicon nanoparticles: the preparation of porous silicon nanoparticles is carried out by electrochemical etching; the silicon wafer is taken out from deionized water, and the silicon wafer is dried with high-puri...

Embodiment 2

[0041] A method for regulating the particle size of porous silicon nanoparticles, comprising the steps of:

[0042] (1) Pretreatment of silicon wafers: first cut the silicon wafers into rectangles of about 1.5×1.5cm, prepare a solution with a volume ratio of concentrated sulfuric acid (98%):hydrogen peroxide=2.5:1, and put the cut rectangular silicon wafers into In the solution, immerse and heat for 10 minutes in a water bath at 75°C, in order to remove organic pollutants on the surface of the silicon wafer. Afterwards, rinse the silicon wafer repeatedly with a large amount of deionized water until the residual liquid after the last rinse is neutral, and store the silicon wafer in deionized water for later use;

[0043] (2) Preparation of porous silicon nanoparticles: the preparation of porous silicon nanoparticles is carried out by electrochemical etching; the silicon wafer is taken out from deionized water, and the silicon wafer is dried with high-purity nitrogen gas, and th...

Embodiment 3

[0046] A method for regulating the particle size of porous silicon nanoparticles, comprising the steps of:

[0047] (1) Pretreatment of silicon wafers: first cut the silicon wafers into rectangles of about 1.5×1.5 cm, prepare a solution with a volume ratio of concentrated sulfuric acid (98%):hydrogen peroxide=3.5:1, and put the cut rectangular silicon wafers into In the solution, immerse and heat for 20 minutes under the condition of 85°C water bath, the purpose is to remove the organic pollutants on the surface of the silicon wafer. Afterwards, rinse the silicon wafer repeatedly with a large amount of deionized water until the residual liquid after the last rinse is neutral, and store the silicon wafer in deionized water for later use;

[0048] (2) Preparation of porous silicon nanoparticles: the preparation of porous silicon nanoparticles is carried out by electrochemical etching; the silicon wafer is taken out from deionized water, and the silicon wafer is dried with high-p...

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Abstract

The invention discloses a method for regulating and controlling the particle size of porous silicon nanoparticles. The porous silicon nanoparticles are more uniformly distributed in methylbenzene after being subjected to ball milling treatment, and the dispersity is better; the particle size distribution range of the porous silicon nanoparticles after ball milling is narrower than that before ball milling, the average particle size is smaller, and the particle distribution is more uniform; the size range of the ball-milled porous silicon nanoparticles is narrower, the average particle size is smaller than 200nm, so that the nanoparticles can meet requirement of a nano-carrier, are higher in actual application rate, better in dispersity in a solvent, and still have fluorescent property; the operation repeatability is achieved when the porous silicon nanoparticles are ball-milled by a planetary ball mill, a standardized process is formed, and the method has important significance on mass production and research application of the porous silicon nanoparticles.

Description

technical field [0001] The invention relates to the field of nanomaterials, in particular to a method for regulating the particle size of porous silicon nanoparticles. Background technique [0002] As a biocompatible substance, porous silicon is widely used in medicine. Porous silicon can be used as a nano-carrier in the fields of chemical, radiation, photodynamic, photothermal, gene, immune and other cancer treatments. Porous silicon produces a micron-scale or nano-scale porous structure on the surface of traditional silicon through a special surface treatment method, thereby Porous silicon nanoparticles are formed. [0003] At present, there is a method of preparing porous silicon by electrochemical etching, and obtaining porous silicon powder particles by scraping. However, the size distribution of porous silicon particles obtained by this method is relatively wide, which does not meet the requirements of cell interaction experiments. Untreated porous silicon has the di...

Claims

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Application Information

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IPC IPC(8): C01B33/021B02C17/10B82Y30/00B82Y40/00
CPCC01B33/021B02C17/10B82Y30/00B82Y40/00
Inventor 郭萍
Owner NANJING COLLEGE OF INFORMATION TECH
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