Water-based full-suspension diamond polishing solution for sapphire and preparation method and application thereof

Abstract

The invention provides a water-based full-suspension diamond polishing solution for sapphire and a preparation method and application thereof. The water-based full-suspension diamond polishing solution for sapphire comprises the following components by mass: 1-10 parts of a suspending agent; 1-10 parts of a dispersant; 10-15 parts of a complexing agent; 0.1-0.5 part of an antirust agent; 1-5 parts of a wetting agent; 0.1-1 part of a defoaming agent; 50 -80 parts of ultrapure water; and 0.1-0.5 part of diamond powder. All the components used in the water-based full-suspension diamond polishing solution for sapphire are low in price and belong to green and environment-friendly reagents, so that the water-based full-suspension diamond polishing solution for sapphire has no harm to operators and the natural environment, and is beneficial to protecting polishing equipment. The polishing solution is excellent in polishing effect, simple in component, low in price and harmless to operators and the environment. The polishing solution is a full-suspension system, so that the problems of scratching caused by agglomeration of the diamond powder and reduction of the removal rate are avoided to the greatest extent.

Description

technical field [0001] The invention relates to polishing fluid technology, in particular to a water-based fully suspended diamond polishing fluid for sapphire, its preparation method and application. Background technique [0002] Sapphire's excellent mechanical properties, stable chemical properties and unique advantages in light transmission make it widely used in LED industry, military industry and national defense and other fields. With the continuous development of the LED industry and the iterative update of products, the requirements for the surface quality of the sapphire substrate are getting higher and higher, so the requirements for the polishing fluid are also getting higher and higher. [0003] Most of the reported sapphire polishing solutions are complex in composition and contain strong acid, strong alkali or other strong corrosive reagents, which are potentially harmful to operators, equipment and the natural environment, and do not meet modern manufacturing ...

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to propose a water-based full-suspension diamond polishing solution for sapphire, aiming at the problem that the current sapphire polishing solution contains strong acid, strong alkali or other strong corrosive reagents, which are potentially harmful to operators, equipment and the natural environment. The polishing liquid is safe, environmentally friendly, green and non-polluting, and can maintain a fully suspended state for a long time, effectively avoiding or reducing the problem of agglomeration of diamond powder placed for a long time, resulting in poor polishing quality and low removal rate

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