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Composite antireflection film and manufacturing method thereof

A technology of anti-reflection film and manufacturing method, which is applied in sputtering plating, ion implantation plating, coating, etc., can solve the problems of being vulnerable to water vapor "erosion" and the decrease of the density of anti-reflection film, so as to reduce the change of reflectivity Possibility, reduction of possibility, effect of increasing service life

Pending Publication Date: 2021-11-26
TRULY OPTO ELECTRONICS
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  • Abstract
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  • Claims
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AI Technical Summary

Problems solved by technology

[0005] The invention discloses a composite anti-reflection film and its manufacturing method, which is used to solve the problem in the prior art that the density of the anti-reflection film decreases and it is easily "eroded" by water vapor

Method used

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  • Composite antireflection film and manufacturing method thereof
  • Composite antireflection film and manufacturing method thereof

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Embodiment Construction

[0031] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be clearly and completely described below in conjunction with specific embodiments of the present invention and corresponding drawings. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0032] The manufacture method of composite type anti-reflection film of the present invention, as figure 1 , figure 2 As shown, the specific steps include:

[0033] Step S10, placing the substrate 1 in a magnetron sputtering device, controlling the flow rate of argon gas, and controlling the flow ratio of argon gas and oxygen gas in the ICP, and alternately for...

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Abstract

The invention discloses a composite antireflection film and a manufacturing method thereof. The manufacturing method comprises the steps of placing a substrate in magnetron sputtering equipment, controlling the flow of argon, controlling the flow ratio of argon to oxygen in ICP, and alternately forming a plurality of low-density first film layers and a plurality of low-density second film layers on the substrate, wherein the first film layers have a first refractive index, the second film layers have a second refractive index, the first refractive index is different from the second refractive index, and the film layer located on the outermost layer is the first film layer; and reducing the flow of the argon, keeping the flow ratio of the argon to the oxygen in the ICP, and forming a third film layer with high density and the first refractive index on the outermost first film layer. According to the composite antireflection film, the third film layer effectively'resists water vapor ', the possibility of reflectivity change is lowered, and therefore the possibility of influencing the optical effect is lowered.

Description

technical field [0001] The invention relates to the technical field of anti-reflection film production, in particular to a composite anti-reflection film and a production method thereof. Background technique [0002] Plastic covers, because they are safer than glass, are also commonly used in automobiles, such as covers for central control screens or instrument screens. In the automotive industry, it is often necessary to coat the surface of the cover with an anti-reflection film to minimize the reflectivity of the surface. This kind of anti-reflection film is commonly used in the industry by magnetron sputtering vacuum plating. [0003] However, due to the high energy of sputtering, the plated film is relatively dense, and the stress is large and greater than that of the plastic substrate, resulting in serious deformation of the plastic substrate. To solve this problem, we increase the amount of argon gas in the coating process, which means that the ejected target atoms a...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08C23C14/10G02B1/115
CPCC23C14/35C23C14/10C23C14/083C23C14/0036G02B1/115
Inventor 周伟杰
Owner TRULY OPTO ELECTRONICS
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