Leveling and focusing method for photoetching machine workpiece table in consideration of system coupling characteristics

A technology of leveling and focusing and lithography machine, which is applied in the direction of photomechanical equipment, microlithography exposure equipment, and photoplate making process of pattern surface, etc. Axis, leveling and focusing speed slow down, etc., to reduce the loss of leveling and focusing precision, facilitate individual control, and increase the final leveling and focusing precision

Active Publication Date: 2021-11-09
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF4 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this type of method does not consider the coupling between the three motion axes during the control process, and the "overshoot" phenomenon is prone to occur in the process of leveling and focusing, resulting in slower leveling and focusing speed and lower accuracy, which cannot be realized. High-performance leveling and focusing of the system

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Leveling and focusing method for photoetching machine workpiece table in consideration of system coupling characteristics
  • Leveling and focusing method for photoetching machine workpiece table in consideration of system coupling characteristics
  • Leveling and focusing method for photoetching machine workpiece table in consideration of system coupling characteristics

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0034] In order to better realize the technical solution of the present invention, the principle on which the present invention is based is briefly described first.

[0035] For the lithography machine workbench using the three-point leveling method, its control system is a 3-input and 3-output system, and its input is the defocus amount z of the workbench, and the inclination angle θ of the workbench in the x-axis direction x , The inclination angle θ of the table in the y-axis direction y , the output is the control index of the three motion axes. It can be seen that the control system belongs to a typical MIMO motion system. The present invention converts this complex MIMO system into three independent SISO systems by analyzing and modeling the internal coupling mechanism, and then controls each logical axis , so that the control parameters of each motion axis can be adjusted independently.

[0036] The coupling of the workbench control system mainly includes two types: t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a leveling and focusing method for a photoetching machine workpiece table in consideration of system coupling characteristics, which comprises the following steps of adopting a leveling and focusing system based on a three-point leveling method for the photoetching machine workpiece table, measuring by adopting a position measuring system to obtain position parameters of the workbench, and converting to obtain expected heights of three motion axes through a preset control logic conversion model, calculating to obtain height adjustment quantities of three motion shafts, sequentially carrying out position correlation decoupling and dynamics correlation decoupling to obtain height adjustment quantities of the three motion shafts after decoupling, and inputting the height adjustment quantities into a motion shaft control system to control the three motion shafts. By reducing the coupling among the motion shafts of the leveling and focusing system, the leveling and focusing accuracy is improved.

Description

technical field [0001] The invention belongs to the technical field of leveling the workpiece table of a photolithography machine, and more specifically relates to a method for leveling and focusing a workpiece table of a photolithography machine in consideration of system coupling characteristics. Background technique [0002] A lithography machine is a device for manufacturing large-scale integrated circuits. The workpiece table is a key component of a lithography machine. played an important role in the filming process. At present, the scanning trajectory tracking control method and technology of the lithography machine workpiece table have been extensively studied, but the research on the leveling and focusing control of the workpiece table during the motion process is relatively small. [0003] At present, the workpiece table system of the lithography machine generally adopts a three-point leveling method to level and focus the exposure plane. figure 1 It is a schemat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00G03F7/20
CPCG03F9/7003G03F7/70725
Inventor 彭超邹见效牛凡谢川于力
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap