Etching solution for titanium and titanium alloy metal sheets

A technology of etching solution and titanium alloy, which is applied in the field of metal etching solution, can solve the problems of slow exothermic reaction speed, large evaporation loss of etching solution, and low production efficiency, so as to improve production efficiency, ensure etching quality, and reduce evaporation loss Effect

Pending Publication Date: 2021-10-29
宁波福至新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It is required that the oxidant in the formula can oxidize alloy elements such as Mo and Zr in titanium and titanium alloys, while hydrochloric acid in the oxidant of hydrofluoric acid and hydrochloric acid in the existing formula can not oxidize Mo alloy elements under production conditions according to chemical reaction thermodynamic analysis (Mo+4HCl=Mo+Cl 4 , its standard free energy △F 0 =9000+59.15T) and hydrofluoric acid, the main oxidant in the formula, although it can oxidize alloy elements such as Mo and Zr in titanium and titanium alloys, a large amount of heat is released during the reaction, resulting in higher and higher temperature of the etching solution , the higher the temperature of the etching solution, the slower the exothermic reaction rate, the greater the evaporation loss of the etching solution, and the lower production efficiency
High temperature and slow speed increase the amount of side etching of titanium metal etching sheet, which greatly reduces the etching quality

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] First, coat a layer of photoresist on the pre-etched titanium plate, dry it at 120°C, then expose it on a double-sided exposure machine according to the designed pattern plate, develop it on a special developing machine, and dry it at 250°C. The dried developing plate is chemically etched on a special etching machine, wherein the etching solution is composed of 10% by volume of hydroiodic acid, 2% by volume of boric acid, and the remainder of water. The product after etching is soaked in the sodium hydroxide aqueous solution of 10% by weight of 90 ℃, till the unetched photoresist all comes off, and puts into drying machine and dries at 150 ℃, obtains final product, after Detection, the maximum amount of side erosion is 0.007mm.

Embodiment 2

[0032] Implement with the implementation method of Example 1, wherein the thickness of the titanium plate is 0.2 mm, exposed with a designed graphic plate, and the etching solution is composed of 13% by volume of hydroiodic acid, 3% by volume of boric acid, and the balance of water. After the final product is tested, the maximum side erosion is 0.008mm.

Embodiment 3

[0034] Carried out with the implementation method of Example 1, wherein the thickness of the titanium plate is 0.3 mm, exposed with a designed graphic plate, and the etching solution is composed of 16% by volume of hydroiodic acid, 4% by volume of boric acid, and the balance of water. After the final product is tested, the maximum side erosion is 0.008mm.

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PUM

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Abstract

The invention relates to an etching solution for titanium and titanium alloy metal sheets. The etching solution for the titanium and titanium alloy metal sheets is composed of hydroiodic acid, boric acid and water. According to the etching solution for the titanium and titanium alloy metal sheets, the problems that the production efficiency is low due to the fact that the evaporation loss of the etching solution is large; and due to high temperature and low speed, the lateral etching amount of a titanium metal etching sheet is increased, and the etching quality is greatly reduced are solved.

Description

technical field [0001] The invention belongs to the field of metal etching liquid, in particular to an etching liquid used for titanium and titanium alloy metal sheets. Background technique [0002] Since titanium wet etching has a variety of etching solution formulations, these formulations are determined according to different masks or photoresists, which contain a certain amount of H 2 SO 4 、HNO 3 、H 3 PO 4 And other compounds and a certain concentration of ammonia solution, but can not etch the microporous pattern of titanium metal sheet. The existing formula uses hydrofluoric acid and hydrochloric acid as an oxidizing agent to form an etching solution to directly etch out the pattern of the titanium metal sheet. It is required that the oxidant in the formula can oxidize alloy elements such as Mo and Zr in titanium and titanium alloys, while hydrochloric acid in the oxidant of hydrofluoric acid and hydrochloric acid in the existing formula can not oxidize Mo alloy e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/26
CPCC23F1/26
Inventor 任忠平尹国钦陈绍文卞海刚蒋晶晶
Owner 宁波福至新材料有限公司
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