A kind of high-quality waveguide structure and preparation method

A waveguide structure, high-quality technology, used in optical waveguides, light guides, instruments, etc., can solve problems such as unrealizable, excellent optical performance, and achieve the effect of low transmission loss

Active Publication Date: 2022-07-08
EAST CHINA NORMAL UNIV
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  • Abstract
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Problems solved by technology

[0004] The purpose of the present invention is to overcome the problems that the pure chemical mechanical polishing process for preparing waveguides cannot achieve more excellent optical properties, and provide a waveguide structure and preparation method that can achieve excellent electro-optic performance, low loss, and good single-mode

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  • A kind of high-quality waveguide structure and preparation method

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Embodiment 1

[0028] see figure 1 , the present invention utilizes femtosecond laser direct writing combined with chemical mechanical polishing technology and bonding lithium niobate thin film to prepare the method for waveguide, comprising the following steps:

[0029] (1) Prepare a lithium niobate wafer and coat its surface with a chrome film: take a 3-inch lithium niobate thin film wafer, the lithium niobate thin film wafer consists of a 300 nm thick lithium niobate thin film 1 and a 4.7 μm thick silicon dioxide layer 2 and a 0.5mm thick single crystal silicon substrate 3, and a 400nm thick chromium film layer 4 is plated on the surface of the lithium niobate film 1 by magnetron sputtering;

[0030] (2) Femtosecond laser direct writing chrome mask: Wipe the above lithium niobate thin film wafer after chrome coating 4 with acetone to keep the surface of the chrome film clean, and then fix it on the glass plate and absorb it with a suction cup It was placed on a three-dimensional motion p...

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Abstract

The invention discloses a high-quality waveguide structure and a preparation method. The preparation includes metal chrome plating on the surface of a lithium niobate film, a femtosecond laser direct writing chrome film as a mask layer, chemical mechanical polishing, chemical vapor deposition, and lithium niobate. Thin film bonding and other steps. The preparation process of the method of the invention optimizes the configuration of the waveguide prepared by the chemical mechanical polishing process, and has the characteristics of ultra-low transmission loss and excellent electro-optical characteristics, provides a key step for realizing the industrialization of lithium niobate photonic devices, and can also promote Development of micro-nano photonics, integrated optics and microwave photonics.

Description

technical field [0001] The invention relates to the field of micro-nano preparation of on-chip integrated lithium niobate waveguides, in particular to a method for preparing high-quality waveguides by using femtosecond laser direct writing combined with chemical mechanical polishing and lithium niobate thin film rebonding technology. The invention is suitable for preparing high-quality waveguide integrated structures on the surface of various thin film materials. Background technique [0002] With the rapid development of the information industry, traditional electronic chips are limited by Moore's Law and use electrons as information carriers, and may face huge challenges in the future; at the same time, integrated optical devices with photons as information carriers are expected to be used in large-capacity, high-speed information A breakthrough was made in the field of transmission. At present, silicon-based photonics technology with silicon-on-insulator substrate as the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/13G02B6/136G02B6/122
CPCG02B6/13G02B6/136G02B6/122
Inventor 程亚陈锦明
Owner EAST CHINA NORMAL UNIV
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