On-chip magnetic core power inductor with inductance value changing along with working current
A technology of working current and power inductance, applied in the application of transformer/inductor core, transformer/inductor shell, magnetic film to substrate, etc., can solve the problem of not being able to maintain low ripple current transient response capability, etc. question
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[0027] The on-chip magnetic core power inductor whose inductance value changes with the working current provided in this embodiment is prepared on a silicon chip by MEMS technology; the winding is made of metallic copper material with a thickness T c 12μm, width w c is 25μm, the coil gap g is 15μm; the width of the anisotropic magnetic core film W m =445μm, length L m =575 μm; the magnetic core film adopts [insulating layer / buffer layer / antiferromagnetic layer (AF) / ferromagnetic layer (FM) / buffer layer / ferromagnetic layer (FM) / antiferromagnetic layer (AF)] n Multi-layer film structure; insulating layer is SiO 2 The thin film is prepared by DC magnetron sputtering method: the sputtering power is 100-200W, the sputtering pressure is 0.2-0.7Pa, and the deposition time is controlled so that SiO 2 The thickness of the film is 4-10nm; the buffer layer is Cu metal thin film, which is prepared by DC magnetron sputtering method: the sputtering power is 25-60W, the sputtering pressur...
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