Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Super-hard wear-resistant transparent film layer material taking silicon-doped carbonized polymer point as construction element and preparation method thereof

A technology of polymer dots and silicon doping, applied in coatings, nano-carbons, etc., can solve the problems that it is difficult to withstand repeated friction of steel wool, and cannot well meet the requirements for the use of optical protective coatings.

Active Publication Date: 2021-07-13
JILIN UNIV
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The pencil hardness of the currently applied organic-inorganic hybrid wear-resistant optical coatings is below 6H, and it is difficult to withstand the repeated friction of steel wool, which still cannot well meet the requirements for the use of optical protective coatings

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Super-hard wear-resistant transparent film layer material taking silicon-doped carbonized polymer point as construction element and preparation method thereof
  • Super-hard wear-resistant transparent film layer material taking silicon-doped carbonized polymer point as construction element and preparation method thereof
  • Super-hard wear-resistant transparent film layer material taking silicon-doped carbonized polymer point as construction element and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Octapropylaminosilsesquioxane (2.2 g, 2.5 mmol) and citric acid (0.72 g, 3.75 mmol) were weighed, dissolved in 10 mL of deionized water, and stirred until completely dissolved. Transfer the resulting mixed solution to a 25 mL polytetrafluoro-lined reaction kettle, and screw it tightly to make it completely sealed. The reaction kettle was placed in an oven at 180° C., and reacted for 5 hours. Then the reactor was taken out and naturally cooled to room temperature to obtain a pale yellow transparent Si-CPDs aqueous solution. Filter the obtained Si-CPDs aqueous solution with a 0.22 μm polyethersulfone filter membrane to obtain Si-CPDs solidified solution 1, which can be directly coated and solidified, or can be freeze-dried to obtain a dry powder for storage. When ready to use, redissolve in water to cure the coating film.

[0026] Slides were plasma-treated (3 min) to make the surface hydrophilic. Take Si-CPDs curing solution 1, evenly spread it on the surface of the g...

Embodiment 2

[0029] Octapropylaminosilsesquioxane (2.2 g, 2.5 mmol) was weighed. Citric acid (0.48g, 2.5mmol), dissolved in 10mL of deionized water, stirred to dissolve completely. Transfer the resulting mixed solution to a 25 mL polytetrafluoro-lined reaction kettle, and screw it tightly to make it completely sealed. The reaction kettle was placed in an oven at 180° C., and reacted for 5 hours. Then the reactor was taken out and naturally cooled to room temperature to obtain a pale yellow transparent aqueous solution of carbonized polymer dots. Filter the obtained Si-CPDs aqueous solution with a 0.22 μm polyethersulfone filter membrane to obtain Si-CPDs solidified liquid 2; perform the coating film curing according to the operation of Example 1, and obtain the cured film 2, and the performance data are shown in Table 1 .

Embodiment 3

[0031] Octapropylaminosilsesquioxane (2.2 g, 2.5 mmol) was weighed. Citric acid (0.145g, 0.8mmol), dissolved in 10mL of deionized water, stirred to dissolve completely. Transfer the resulting mixed solution to a 25 mL polytetrafluoro-lined reaction kettle, and screw it tightly to make it completely sealed. The reaction kettle was placed in an oven at 180° C., and reacted for 5 hours. Then the reactor was taken out and naturally cooled to room temperature to obtain a pale yellow transparent aqueous solution of carbonized polymer dots. The obtained carbonized polymer dot aqueous solution was filtered with a 0.22 μm polyethersulfone filter membrane to obtain Si-CPDs solidified solution 3; the coating film was solidified according to the operation of Example 1, and the obtained solidified film 3 was obtained. The performance data are shown in the table 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a super-hard wear-resistant transparent film layer material which is compounded on a nano scale and takes the silicon-doped carbonized polymer point as a construction element and a preparation method of the super-hard wear-resistant transparent film layer material, and belongs to the technical field of preparation of super-hard wear-resistant scratch-resistant transparent film materials. The preparation method comprises the following steps: weighing propylamino silsesquioxane and citric acid in a molar ratio of 1: (0.1-4), dissolving the propylamino silsesquioxane and the citric acid in deionized water, and then carrying out hydrothermal reaction at 160-200 DEG C for 3-8 hours; then naturally cooling to room temperature to obtain a faint yellow transparent Si-CPDs aqueous solution, and filtering by using a 0.22 mu m polyether sulfone filter membrane to obtain Si-CPDs curing liquid with silicon hydroxyl on the surface; and spin coating, dip coating or spray coating the curing liquid onto the surface of a glass slide subjected to Plasma treatment for 3-5 minutes, and curing for 0.5-3 hours at the temperature of 60-200 DEG C to obtain the super-hard wear-resistant transparent film layer. The film material can be used for preparing surface hard wear-resistant protective layers of displays, transparent optical devices and solar cells.

Description

technical field [0001] The invention belongs to the technical field of preparation of super-hard wear-resistant and scratch-resistant transparent film materials, and specifically relates to a super-hard wear-resistant transparent film material compounded on the nanometer scale with silicon-doped carbonized polymer dots as building blocks and its According to the preparation method, the film layer material can be used for the surface hard wear-resistant protective layer of displays, transparent optical devices and solar cells. Background technique [0002] Optical coatings have a wide range of applications in displays, transparent optical devices, and solar cells. Optical coatings can be divided into two broad categories: polymeric optical coatings and inorganic optical coatings. Polymer optical coatings have the advantages of light weight, impact resistance, and easy processing and molding, but the polymer has low surface hardness and poor wear resistance. Inorganic optica...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C09D1/00C01B32/15
CPCC09D1/00C01B32/15
Inventor 杨柏潘凯波朱志承乐妲刘崇铭李睿王静博韩梅
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com