Photomask and photomask defect inspection method

Abstract

According to a photomask and a photomask defect inspection method provided by the invention, a mark pattern is arranged in a cutting channel region of the photomask, and a defect inspection program of the photomask is established by taking the coordinate of the mark pattern as the reference point, so that the photomask defect inspection program is established under the condition of complete offset, and the defect inspection program is established without occupying the scanning time of other photomasks; the utilization rate of the sheet sweeping machine is improved; and the defect inspection program of the photomask is established by taking the coordinates of the mark pattern as reference points, so that the establishment period of the defect program can be greatly shortened, and manpower is saved. Furthermore, image calibration can be carried out by taking the mark pattern as a light source calibration point and a cutting channel characteristic pattern calibration point, so that the defect inspection program of the multilayer photomask has the same light source calibration point and the same cutting channel characteristic pattern calibration point, the generality of the defect inspection program is improved, the program establishment time and the program sharing probability are further saved, and the inspection efficiency of the machine is improved to a certain extent.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a photomask and a method for inspecting the defect of the photomask. Background technique [0002] A photolithography mask, also known as a photomask, is a master pattern used in the photolithography process of an integrated circuit. The production process of a product chip usually needs to go through dozens of photolithography times, and each photolithography requires a photomask. Photolithography, which replicates patterns onto wafers in a manner similar to photoprocessing. The quality of the photomask affects the quality of the product. When the photomask is irradiated by the laser of the lithography machine for a certain period of time, it will produce haze defects. Once the haze defect occurs, it will have a great impact on the yield of the product. The photomask Usually it can only be sent back to the mask factory for repair. Therefore, it is particularly important...

AI Technical Summary

Problems solved by technology

Usually, it takes 1 to 2 hours to establish a defect scanning program for a single photomask, and since the photomask is a high-precision and fragile product, the loading requirements are strict and the loading is slow, and it takes 10 to 15 minutes to transfer to the photomask defect inspection station. Start the defect scanning program, and a set of masks can range from a few layers to as many as dozens of layers. The defect scanning program takes a long time to build and takes up the scanning time of other masks, reducing the utilization rate of the machine.

Images