Preparation method for preparing multi-element nitride based on mixed deposition technology

Abstract

The invention discloses a preparation method for preparing multi-element nitride based on a mixed deposition technology. The preparation method comprises the following steps of first, material and equipment preparation, wherein a four-blade end milling cutter is placed into a reaction chamber, and the temperature is raised to carry out surface heat treatment; and second, dosage calculation and equipment testing, wherein a coating mixing test is carried out according to material selection determination in an operation area and multi-arc ion plating and sputtering structure fixation. According to the preparation method for preparing the multi-element nitride based on the mixed deposition technology, the milling cutter is subjected to heating treatment through the reaction chamber, so that the fixing and absorbing of a spraying material by the milling cutter are guaranteed; the added material is sprayed to the surface of the milling cutter through multi-arc ion plating, so that the adhesiveness between a coating and a substrate is guaranteed; and complete combination of the AlCrWSi nano-composite coating adhering to the outer surface of the cooled milling cutter is ensured through multi-arc ion plating and sputtering simultaneous mixed spraying, so that the wear resistance of the cutter is changed, and the service life of the cutter is prolonged.

Description

technical field [0001] The invention relates to the technical field of preparing multi-component nitrides, in particular to a preparation method for preparing multi-component nitrides based on a hybrid deposition technology. Background technique [0002] In the 1990s, sputtering and multi-arc ion plating were the mainstream technologies for physical vapor deposition technologies in the world, and these two technologies have their own advantages and disadvantages. The surface roughness of the coating prepared by the sputtering method is low, and the precipitation rate is slower than that of the multi-arc ion plating. On the other hand; compared with the sputtering method, multi-arc ion plating has an important advantage that it will generate a large amount of plasma at the cathode, so that the plasma has enough kinetic energy to coat the surface of complex workpieces, and Provides good adhesion between the coating and the substrate. However, metal particles are produced dur...

AI Technical Summary

Problems solved by technology

However, metal particles will be produced during the deposition process, resulting in a rough coating surface and reducing the uniformity of the film layer.