Vacuum system and immersion lithography machine using same

A vacuum system and vacuum source technology, applied in the field of vacuum systems, can solve the problems of high cost, complicated installation and configuration, and many fluid components, and achieve the effects of stable vacuum pressure, reduced complexity and cost

Active Publication Date: 2021-04-20
ZHEJIANG CHEER TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] in In the vacuum system shown in Figure 1, the gas-liquid two-phase flow is separated into gas and liquid in the gas-liquid separation tank 2 and then pumped by two mutually independent flow paths, requiring at least two pumping Exhaust pump and two control valves, and models suitable for two fluid media respectively, make the vacuum system have more fluid components, complex installation configuration, and high cost

Method used

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  • Vacuum system and immersion lithography machine using same
  • Vacuum system and immersion lithography machine using same
  • Vacuum system and immersion lithography machine using same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A vacuum system, comprising a gas-liquid separation tank 2; the upper part of the gas-liquid separation tank 2 leads to a first flow path 21, the lower part of the gas-liquid separation tank 2 leads to a second flow path 22, and the first flow path 21 is provided with a first control valve 51 ; The second control valve 52 is set on the second flow path 22; The gas-liquid two-phase flows from the fluid source 1 into the gas-liquid separation tank 2, relying on the principle of gravity separation, the gas phase gathers in the upper part of the gas-liquid separation tank 2 and the liquid phase gathers in the lower part of the gas-liquid separation tank 2; the gas enters the first flow path 21, the liquid enters the second flow path 22; the gas and liquid are continuously pumped by the first vacuum source 31 after they merge. The pressure sensor 4 is set to monitor the pressure inside the gas-liquid separation tank 2 and transmits the pressure signal to the controller. Adj...

Embodiment 2

[0029] Such as image 3 As shown, a vacuum regulator 53 is set in the first flow path 21, such as the ITV 2090 series vacuum regulator of SMC brand, and the vacuum regulator 53 can adjust the pressure in the first flow path 21 according to the signal provided by the control source 531 to make it Stable, the control source 531 can be an electrical signal, a gas source, a liquid source or a manual adjustment device; adjusting the pressure in the first flow path 21 to stabilize means controlling the pressure in the gas-liquid separation tank 2 to stabilize. The remaining implementation modes are the same as the first embodiment.

[0030] For the situation that the gas content in the gas-liquid two-phase flow is small, the second flow path 22 can be set as a small elongated tube with an inner diameter; or the control valve in the second flow path 22 can use a throttle 54; the throttle 54 can be a simple damping hole, or a valve that can manually adjust the opening. Through the l...

Embodiment 3

[0032] Such as Figure 4 As shown, the vacuum system also includes a buffer tank 20, the first flow path 21 and the second flow path 22 are connected to the buffer tank 20, and gas and liquid are respectively introduced into the buffer tank 20; preferably the first flow path 21 is connected to the buffer tank 20 the upper part of the buffer tank 20 while the second flow path 22 is connected to the lower part of the buffer tank 20; use the first vacuum source 31 to pump fluid from the bottom of the buffer tank 20. All the other implementations are the same as in Embodiment 2.

[0033] Using the buffer tank 20 as the mixing node of the first flow path 21 and the second flow path 22 effectively expands the volume of the mixing node, can reduce the mutual impact interference between gas and liquid, and is beneficial to suppress the pressure pulsation generated during the fluid mixing process, It is also beneficial to maintain and improve the control accuracy of the vacuum regulat...

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Abstract

The invention relates to a vacuum system and an immersion lithography machine using the same. The vacuum system comprises a gas-liquid separation tank, wherein a gas-liquid two-phase flow is separated into a gas-phase fluid and a liquid-phase fluid in the gas-liquid separation tank, and the gas-phase fluid and the liquid-phase fluid flow along two flow paths respectively; the two flow paths for conveying gas and liquid are converged and communicated and then are pumped and discharged by a vacuum source in a unified mode; a control valve is arranged on the flow path for conveying the gas or the liquid; and feedback adjustment is conducted according to the pressure in the gas-liquid separation tank or an auxiliary flow path so as to guarantee that the vacuum pressure output to a pumping and discharging port is stable. According to the vacuum system and the immersion lithography machine using the same, the technical problem that a high-precision vacuum regulator is not suitable for making contact with liquid is solved, high-precision control over vacuum pressure can be achieved through a small number of flow control devices, the complexity and cost of the system are reduced, and the system is particularly suitable for pumping and discharging gas-liquid two-phase flow with a small liquid content.

Description

technical field [0001] The invention belongs to the technical field of vacuum systems, and relates to a vacuum system and an immersion photolithography machine using the vacuum system. Background technique [0002] Vacuum systems are used to pump fluids, and sometimes it is necessary to fine-tune the pressure provided by the vacuum system to maintain a stable pumping capacity. If the object to be pumped is a gas-liquid two-phase flow, there is a problem of poor pressure control accuracy. The reason for the poor pressure stability of the exhaust-liquid two-phase flow in the vacuum system is mainly because the gas-liquid two-phase flow itself often has relatively strong pressure fluctuations, which will interfere with the pressure feedback adjustment function of the vacuum system; in addition, in order to obtain high pressure Stability, the vacuum system needs to be equipped with high-performance pressure sensors, control valves and other fluid control components, and high-pe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 嵇佳李元杜亮张颖徐宁付婧媛付新
Owner ZHEJIANG CHEER TECH CO LTD
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