Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Carrier-free facial mask as well as preparation method and application thereof

A mask and base film technology, applied in the field of skin care, can solve problems such as environmental pollution and human skin damage, and achieve the effects of good skin care effect and experience, high market economic value, high efficiency and cost controllability

Pending Publication Date: 2021-02-23
李和伟
View PDF5 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, general facial mask products contain a large amount of chemical substances and preservatives and other ingredients that are harmful to the skin. The extensive use of facial mask products will not only cause certain damage to human skin, but also cause certain pollution to the environment.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] Embodiment 1 base film formula and production process

[0054] Recipe 1.1

[0055] 5% capers polysaccharide dissolved in water

[0056] Recipe 1.2

[0057] A mixture of 1% capers polysaccharide, 10% sodium alginate and 0.1% sclerotinium dissolved in water

[0058] Recipe 1.3

[0059] A mixture of 5% alginic acid, 0.3% guar gum, 0.5% sclerotin, 5% fructan, and 1% PVM / MA copolymer is dissolved in oil-in-water with a water content greater than 60%. solution system

[0060] Recipe 1.4

[0061] 1% sodium hyaluronate, 0.05% silicon powder, mixed and dissolved in water

[0062] Recipe 1.5

[0063] 1% sodium alginate, 5% sugar isomers, 0.001% titanium dioxide, 0.005% montmorillonite, 0.005% talcum powder, mixed and dissolved in water.

[0064] The above-mentioned ingredients can be expanded in the following proportions, and they can also achieve self-shaping after mixing and drying, and have certain toughness and good skin feel. When using, add water or other solutions ...

Embodiment 2

[0073] Embodiment 2 skin care active ingredient (inkjet ink) formula and inkjet ink preparation method

[0074] Formula 2.1 (for whole face moisturizing)

[0075] Resveratrol: ethanol=1 part: 19 parts (solution of 5% resveratrol), ink surface tension 20mN / m, viscosity 1cps, pH value is 6.5.

[0076] Formula 2.2 (for whole face moisturizing)

[0077] Ferulic acid: glycerol glucoside: C14-22 alkyl glucoside = 1:50:50 (solution of 0.01% ferulic acid), surface tension 80mN / m, viscosity 100cps, pH value 5.5.

[0078] Formula 2.3 (suitable for whole face moisturizing)

[0079] Tetrahydromethylpyrimidine carboxylic acid: glycyrrhetinic acid: butylene glycol: ferulic acid: Tween 20: hydrogenated polydecene=1 part: 1 part: 5 parts: 3 parts: 3 parts (14% tetrahydro+14 % liquorice solution), ink surface tension 37mN / m, viscosity 100cps, pH value 6.

[0080] Formula 2.4 (for pigmented skin)

[0081] Ferulic acid: baicalin: neopentyl glycol dicaprate: polyglyceryl stearate = 12 parts:...

Embodiment 3

[0113] Embodiment 3 customized skin care method

[0114] The various formulations of Example 2 were made into ink-jet inks, placed in different containers, and numbered. When actually customizing the skin care mask, according to the data of the skin tester, the beautician will put the ink bottle matching the applicable number into the inkjet cartridge, set it in different printing areas and different ink cartridges according to the skin test report, and then start the printing function for online Custom face mask printing.

[0115] Specific steps are as follows:

[0116] 1) Detect the skin condition and face shape through the skin detection device installed in the beauty place,

[0117] 2) Match the corresponding ink formula;

[0118] 3) Set the printing position and ink cartridge, start the printing function, and print on the film cloth;

[0119] 4) Then punch the membrane cloth into the specified shape.

[0120] The specific application examples are only excerpts of typ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Solution viscosityaaaaaaaaaa
Thicknessaaaaaaaaaa
Surface tensionaaaaaaaaaa
Login to View More

Abstract

The invention discloses a customized carrier-free facial mask as well as a preparation method and application thereof. The customized carrier-free facial mask comprises a base film and skin-care active ingredients sprayed on the base film; the raw material of the base film comprises a film-forming agent, and the film-forming agent is selected from one or more of tamarindus indica seed polysaccharide, polygonatum odoratum polysaccharide, sodium alginate, sodium hyaluronate, alginic acid, guar gum, sclerotium gum, fructo-oligosaccharide, saccharide isomeride, fructan and a PVM / MA copolymer; andthe base film can further comprise granules, and the granules comprise one or more of silicon powder, titanium dioxide, mica, montmorillonite, talcum powder and starch. According to the facial mask, the specific requirements of customized precise skin care are comprehensively considered, and meanwhile, the high efficiency and cost controllability of industrial production are considered, so that the developed customized carrier-free facial mask has an extremely good skin care effect and experience feeling, and also has an extremely high market economic value.

Description

technical field [0001] The invention relates to the technical field of skin care, in particular to a customized carrier-free facial mask and its preparation method and application. Background technique [0002] The mask products on the market are uneven, and new mask products with different functions and different forms of use are also emerging one after another. The reason is that, on the one hand, modern women and even men pay more and more attention to appearance, especially skin care. With the increase of mask consumption groups, consumers’ appeals tend to be more and more subdivided and personalized, such as whitening and brightening, continuous moisturizing, freckle removal in various parts, and masks with specific effects in different seasons, temperatures, and different skin conditions. demands. However, general facial mask products contain a large amount of chemical substances and preservatives and other ingredients harmful to the skin. The extensive use of facial ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/25A61K8/26A61K8/29A61K8/64A61K8/65A61K8/73A61K8/9728A61K8/9789A61Q19/00A61Q19/08
CPCA61K8/73A61K8/733A61K8/735A61K8/737A61K8/25A61K8/29A61K8/26A61K8/64A61K8/65A61K8/9728A61K8/9789A61Q19/08A61Q19/00A61K2800/85
Inventor 李和伟
Owner 李和伟
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com