A deep ultraviolet depolarizer detection device and detection method

A technology of detection device and depolarizer, which is applied in the direction of testing optical properties, etc., can solve the problems such as difficulty in guaranteeing the quality of polarizers, and achieve the effects of avoiding uncertain phase shift, simple optical path, and easy preparation

Active Publication Date: 2022-03-08
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

In particular, the depolarizers used in high-end lithography machines have working wavelengths in the deep ultraviolet range, and the quality of polarizers is difficult to guarantee, which puts higher requirements on the simplicity of components

Method used

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  • A deep ultraviolet depolarizer detection device and detection method
  • A deep ultraviolet depolarizer detection device and detection method
  • A deep ultraviolet depolarizer detection device and detection method

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Embodiment 2

[0060] Please refer to first Figure 4 , Figure 4 It is a schematic structural diagram of a deep ultraviolet returner detecting device and a detection method according to the present embodiment, and the quasi-molecular laser wavelength is 193.4 nm.

[0061] The mirror group is a pair of plane mirrors, the mirror 1 and the horizontal plane angle are 45 °, the mirror 2 and the horizontal angle of -32.66 °; the expansion mirror group is a telephoto system, and the diameter of the incorrect 8mm, the expansion magnification is 11 times; after the light enlargement, it is incident to the Brocci cross-mirror 1; the reflected line polarization is incident to the delarger to be tested.

[0062] In this embodiment, the expanded mirror group prevents the introduction uncertain phase shift prior to the melting stone plane plane; if there are other needs, additional functional components must be added, and must be placed before the melted stone plane mirror 1. The melted stone plane plane can e...

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Abstract

The invention discloses a deep ultraviolet depolarizer detection device and a detection method. The operating wavelength of high-end lithography machines is in the deep ultraviolet band, and the optical materials that can be selected are very rare. Many polarizers commonly used in other bands are difficult to process, which brings difficulties to the performance testing of depolarizers. In this device, the light emitted by the monochromatic light source passes through the Brewster polarizer, the depolarizer to be tested and the Brewster polarizer in sequence. The Brewster analyzer system consists of a Brewster analyzer and a detector, and the detector records the output intensity. The surface of the polarizer and analyzer is flat, and the light is incident at Brewster's angle to obtain linearly polarized reflected light. The degree of polarization of the depolarized light can be obtained from the recorded maximum and minimum values ​​of the intensity of the outgoing light, which reflects the depolarization performance of the depolarizer. The deep ultraviolet depolarizer detection device and detection method provided by the present invention have the characteristics of stable structure, simple optical path, easy production and manufacture of components, etc., and meet the detection needs of deep ultraviolet depolarizers.

Description

Technical field [0001] The present invention relates to the performance detection of the pencilor, in particular, a deep UV backupser detecting device and a detection method have a feature suitable for the detection of deep ultraviolet retraceries, structural stability, simple optical path, and easy production. Background technique [0002] With the development of large-scale integrated circuits, the resolution requirements of the photolithography system are getting higher and higher. The returker can eliminate the response of the beam biasing state in the precision optical system, it is important in the high-end lightning machine. Since strict analysis requires the use of Stokes vector and Muller matrix algorithm, the effects of various errors in the actual processing are difficult to calculate, so they need to be directly polarized to the finished product. However, the high-end photolithography machine is in terms of ultraviolet, deep ultraviolet and even ultraviolet bands, res...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02
CPCG01M11/02
Inventor 曾爱军张灵浩夏克贵朱玲琳黄惠杰
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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