Novel heterojunction photoelectric device based on perovskite and preparation method thereof
A photoelectric device, perovskite technology, applied in the field of new heterojunction photoelectric devices based on perovskite and its preparation, can solve the problems of limiting perovskite research, poor detection and external quantum efficiency, and difficult photoelectric characteristics , to achieve the effect of great application potential, simple production and low cost
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[0039] A method for preparing a novel heterojunction photoelectric device based on perovskite, comprising the following steps:
[0040] (1) in 1×1cm 2 Highly doped p-type Si is used as the substrate, and after being ultrasonically cleaned in acetone for 10 minutes, and then alternately washed with ethanol and deionized water for 3 times, a high-conductivity semiconductor substrate 1 is obtained;
[0041] (2) A layer of HfO is grown on the surface of the high-conductivity semiconductor substrate 1 by atomic layer deposition (ALD) 2 layer, the thickness of which is about 20nm;
[0042] (3) Design the pattern of the source electrode 3 and the drain electrode 4 and the length of the channel through the mask plate, and the HfO 2 A source electrode 3 and a drain electrode 4 of Ti / Au material are deposited on the layer;
[0043] (4) by CsAc solution and PbBr 2 The solution is mixed according to the molar ratio of 1:4, and the reaction will proceed immediately to form perovskite C...
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