A 3D structured light 940nm narrow-band filter and its preparation method

A technology of narrow-band optical filter and structured light, which is applied in the field of optical filter to achieve the effect of accurate wavelength positioning and good steepness

Active Publication Date: 2021-03-05
苏州京浜光电科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In this way, the conventional titanium dioxide / silicon dioxide combination cannot meet the requirements; for this reason, we propose a 3D structured light 940nm narrow-band filter and its preparation method

Method used

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  • A 3D structured light 940nm narrow-band filter and its preparation method
  • A 3D structured light 940nm narrow-band filter and its preparation method
  • A 3D structured light 940nm narrow-band filter and its preparation method

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Embodiment 1

[0017] see figure 1 , in an embodiment of the present invention, a 3D structured light 940nm narrow-band filter includes a substrate, one side of the substrate is alternately evaporated with silicon dioxide layers and silicon tetrahydrogen layers, and the other side of the substrate is alternately evaporated with silicon dioxide Silicon layer and silicon tetrahydrogen layer, the total number of layers of the silicon dioxide layer and silicon tetrahydrogen layer on each side is set to 20-40 layers, the refractive index of the silicon tetrahydrogen is 4.41, and the silicon dioxide The refractive index is 1.48; the sputtering parameters of the silicon tetrahydrogen are: sputtering power 8500W, H 2 24sccm, O 2 It is 22sccm; the sputtering parameters of silicon dioxide are: sputtering power 8500W, H 2 0sccm, O 2 It is 20sccm, and the ion source energy is 2000w.

[0018] Preferably, the thickness of the silicon dioxide layer on each side is set to 1300-2000 nm, and the thickness...

Embodiment 2

[0036] see figure 1 with figure 2 , in an embodiment of the present invention, a 3D structured light 940nm narrow-band filter includes a substrate, one side of the substrate is alternately evaporated with silicon dioxide layers and silicon tetrahydrogen layers, and the other side of the substrate is alternately evaporated with silicon dioxide For the silicon layer and the silicon tetrahydrogen layer, the total number of layers of the silicon dioxide layer and the silicon tetrahydrogen layer on each side is set to 27 layers.

[0037] Preferably, the thickness of the outermost silicon dioxide layer on each side is set to 100 nm, and 100 nm is the outermost layer in order to prevent the silicon tetrahydrogen layer from reacting with components in the air.

[0038] Preferably, the substrate is set to be AF32 glass or D263T glass.

[0039] A preparation method of a 3D structured light 940nm narrow-band filter, comprising the following steps:

[0040] Step 1: Select the substrat...

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Abstract

The invention discloses a 3D structured light 940nm narrow-band filter and a preparation method thereof, comprising a substrate, one side of the substrate is alternately vapor-deposited with silicon oxide layers and hydrogenated silicon layers, and the other side of the substrate is alternately vapor-deposited with silicon oxide layers and a hydrogenated silicon layer, the total number of layers of the silicon oxide layer and the hydrogenated silicon layer on each side is set to 20-40 layers, the thickness of the silicon oxide layer on each side is set to 1300-2000nm, and the silicon hydrogenated layer on each side The thickness is set to 400‑800nm. According to the present invention, the obtained optical filter can make the refractive index of hydrogenated silicon reach 3.8-4.5, and the refractive index of silicon dioxide reach 1.4-1.6, which can meet the requirements of large angle and small deviation; the adopted film system scheme has accurate wavelength positioning , the steepness is good; the space layer is made of hydrogenated silicon material with high refractive index, and the coupling layer is made of silicon dioxide material with low refractive index, so that the offset caused by the angle effect is smaller than that of materials with low refractive index.

Description

technical field [0001] The invention relates to the technical field of optical filters, in particular to a 3D structured light 940nm narrow-band optical filter and a preparation method thereof. Background technique [0002] At present, the narrow-band filter in the visible and near-infrared bands is a multilayer film composed of commonly used coating materials titanium dioxide and silicon dioxide alternately. The refractive indices of the two materials are 2.4 and 1.46 respectively, and their refractive index ratio is 1.64. When testing its spectral transmittance, it will be found that under the conditions of 0 degrees and 30 degrees, the wavelength shift is about 30nm (near the wavelength of 900nm). With the development of 3D camera technology, the corresponding filter is required The smaller the offset of the center wavelength (940nm) is, the better, and at the same time cut off the light in the rest of the bands to avoid interference caused by stray light. In this way, t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/28G02B1/00
CPCG02B1/00G02B5/281G02B5/286
Inventor 杨志民孟庆宣
Owner 苏州京浜光电科技股份有限公司
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