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High-resolution hard X-ray tungsten/gold Fresnel zone plate and preparation method thereof

A high-resolution, X-ray technology, applied in radiation/particle processing, application of diffraction/refraction/reflection for processing, nanotechnology, etc., can solve the problem that the outermost ring width of the zone plate and the large aspect ratio cannot be taken into account. , to achieve the effect of improving the success rate of sample preparation, reducing the cost, and improving the etching selection ratio

Active Publication Date: 2020-04-07
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a new type of high-resolution zone plate for hard X-ray imaging and its preparation method to solve the problem that the outermost ring width and high aspect ratio of the zone plate processed by the prior art cannot be balanced question

Method used

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  • High-resolution hard X-ray tungsten/gold Fresnel zone plate and preparation method thereof
  • High-resolution hard X-ray tungsten/gold Fresnel zone plate and preparation method thereof
  • High-resolution hard X-ray tungsten/gold Fresnel zone plate and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0046] Example 1: Preparation of high-resolution hard X-ray tungsten / gold Fresnel zone plate by etching method

[0047] (1) Select the silicon nitride diaphragm base material with a thickness of 100nm. A 5nm / 15nm Cr / Au layer is deposited on the substrate by physical vapor deposition as a conductive metal layer. The result is as figure 1 shown;

[0048] (2) On the seed layer, a 300nm metal tungsten film is deposited by PVD. The result is as figure 2 shown;

[0049] (3) Spin-coat a layer of HMDS on the front side of the substrate with a metal layer as an adhesion layer, then spin-coat a 250nm PMMA photoresist, and bake it at 180°C for 1 hour. The result is as image 3 shown;

[0050] (4) Expose the sample under the electron beam exposure machine, develop the exposed sample with 1:3 MIBK and IPA, the time is 1.5 minutes, the development temperature is 23°C; and wash in IPA for 30 seconds. The result is as Figure 4 shown;

[0051] (5) Electroplate Au on the surface o...

Embodiment 2

[0054] Example 2: Preparation of high-resolution hard X-ray tungsten / gold Fresnel zone plate by etching method

[0055] (1) Select the silicon nitride diaphragm base material with a thickness of 100nm. A 10nm / 15nm Ti / Au layer is deposited on the substrate by physical vapor deposition as a conductive metal layer. The result is as Figure 8 shown;

[0056] (2) On the seed layer, a 300nm metal tungsten film is deposited by PVD. The result is as Figure 9 shown;

[0057] (3) Spin-coat a layer of HMDS on the front side of the substrate with a metal layer as an adhesion layer, then spin-coat a 250nm PMMA photoresist, and bake it at 180°C for 1 hour. The result is as Figure 10 shown;

[0058] (4) Expose the sample under the electron beam exposure machine, develop the exposed sample with 1:3 MIBK and IPA, the time is 1.5 minutes, the development temperature is 23°C; and wash in IPA for 30 seconds. The result is as Figure 11 shown;

[0059] (5) Electroplate Au on the surfac...

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Abstract

Belonging to the technical field of X-ray imaging, the invention particularly relates to a high-resolution hard X-ray tungsten / gold Fresnel zone plate and a preparation method thereof. The method includes the steps of: growing a chromium / gold electroplated seed layer on a silicon nitride substrate; growing metal tungsten on the electroplated seed layer; conducting spin-coating of a PMMA positive photoresist on the substrate, and performing baking and curing; utilizing an electron beam lithography machine to perform exposure; conducting developing, and then performing rinsing with IPA to obtaina photoresist zone plate structure; taking the photoresist as a mask, and carrying out nano gold electroplating on the upper layer to obtain an upper-layer gold zone plate; and putting the upper-layer gold zone plate into a reactive ion etching machine, taking the gold zone plate as a mask to etch metal tungsten, and transferring the pattern to obtain the tungsten / gold Fresnel zone plate. The zone plate has a high resolution with large aspect ratio (greater than 20 / 1). The method can also be used for preparation of a Fresnel zone plate lens for soft X-ray to hard X-ray detection, the obtainednano-pattern structure is controllable in morphology, and the method is compatible with the existing semiconductor process.

Description

technical field [0001] The invention belongs to the technical field of X-ray imaging, and in particular relates to an X-ray zone plate and a preparation method thereof. Background technique [0002] The nano-focusing of X-ray optical elements can form micro-nano probes, which can detect the interior of the material in a natural in-situ state without damage; it can also perform full-field three-dimensional microscopy of the three-dimensional structure inside the material through a lens with magnifying imaging function. imaging. The focus and imaging of current X-ray optical systems are mainly based on metal zone plates. Its resolution is 1.22 times (normal incidence) or 0.61 times (oblique incidence) of the bandwidth of the outermost ring. Therefore, in order to achieve high-resolution detection and imaging of X-rays, it is necessary to reduce the width of the outermost ring of the zone plate; at the same time, to achieve high-efficiency focusing, the thickness of the zone ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/06B82Y40/00
CPCG21K1/062B82Y40/00
Inventor 陈宜方朱静远
Owner FUDAN UNIV
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