Reduced graphene oxide-based temperature sensor, preparation method thereof and application
A temperature sensor, graphene technology, applied in the sensor field, can solve the problem of less temperature sensors, achieve the effects of ultra-fast temperature detection, improve temperature sensitivity, and high thermal conductivity
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[0037] The embodiment of the present invention also provides a method for preparing a temperature sensor based on reduced graphene oxide, comprising:
[0038] provide the substrate;
[0039] disposing an insulating material layer on the surface of the substrate;
[0040] modifying a silane coupling agent on the surface of the insulating material layer;
[0041] making the graphene oxide film covalently bonded to the surface of the insulating material layer by reacting with the silane coupling agent;
[0042] Arranging two or more electrodes spaced apart from each other on the surface of the graphene oxide film; and
[0043] Annealing the graphene oxide film in an air atmosphere to obtain a reduced graphene oxide film with an electrical conductivity of 5-15 S / cm.
[0044] In some embodiments, the temperature of the annealing treatment is 170-180° C., and the time is 3-4 minutes.
[0045] For example, in some more specific embodiments, by controlling the annealing condition ...
Embodiment 1
[0066] A temperature sensor based on reduced graphene oxide provided in this embodiment includes a substrate, a silicon dioxide layer and a reduced graphene oxide film that are sequentially arranged on the surface of the substrate, and the reduced graphene oxide film and the two The silicon oxide layer is covalently bonded by a silane coupling agent, and a plurality of electrodes are arranged on the reduced graphene oxide film, and the plurality of electrodes are spaced apart from each other.
[0067] The structure of the temperature sensor of this embodiment can refer to figure 1 Shown, its a kind of preparation process comprises:
[0068] (1) First use the solution of perhydropolysilazane (PHPS) in toluene, and use the solution of perhydropolysilazane (PHPS) in toluene on the purchased 500 μm thick polyimide (PI) film substrate 1 solution, and a silicon dioxide film was prepared as a flat layer 2 by a spin coating method. Wherein, the rotating speed is 2000rad / min, and the...
Embodiment 2
[0078] The preparation process of the temperature sensor of this embodiment includes the following steps:
[0079] (1) First use a solution of perhydropolysilazane (PHPS) in toluene, and use perhydropolysilazane (PHPS) in toluene on the purchased 500 μm thick polydimethylsiloxane (PDMS) film substrate solution in , a silicon dioxide film was prepared as a flat layer by spin coating. Wherein, the rotating speed is 2000rad / min, and the thickness of the obtained silicon dioxide is below 100nm. The thin film with a flat layer was annealed on a hot stage at 300° C. for 1 hour, and then treated with oxygen plasma at a power of 100 W for 3 minutes.
[0080] (2) Deposit 3-aminopropyltriethoxysilane (APTES) 3 on the silicon dioxide planar layer by vapor deposition method at 40° C., and then put the substrate into ethanol for 10 minutes of ultrasonication.
[0081] (3) After drying, immerse it in a graphene oxide aqueous solution (0.2 mg / mL) for 60 minutes, and then ultrasonicate the ...
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