Polysilicon slag slurry harmless treatment system

A harmless treatment, polysilicon technology, applied in the direction of inorganic chemistry, silicon compounds, sustainable waste treatment, etc., can solve the problems of unfriendly environment, high energy consumption, etc., reduce the difficulty of maintenance, realize closed-circuit circulation, and improve environmental protection Effect

Pending Publication Date: 2019-12-17
新疆戈恩斯能源科技有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] This application provides a polysilicon slurry harmless treatment system to solve the problem that the existing polysilicon slurry treatment process includes a hydrolysis process, which is not friendly to the environment and consumes a lot of energy

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polysilicon slag slurry harmless treatment system
  • Polysilicon slag slurry harmless treatment system
  • Polysilicon slag slurry harmless treatment system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] In order to make the above objects, features and advantages of the present application more obvious and comprehensible, the present application will be further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0031] The embodiment of the present application discloses a polysilicon slag harmless treatment system. This method is applied to the production of polysilicon by the Siemens method to generate a large amount of waste residue, which cannot be discharged directly, so the waste residue needs to be harmlessly treated.

[0032] refer to figure 1 , is a structural schematic diagram of a polysilicon slurry harmless treatment system provided in the embodiment part of the present application. The polysilicon slurry harmless treatment system includes: a filter device 10, a storage device 20 and a mixing device connected in sequence through pipelines device 30. The filtering device 10 is used to filter the slurr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The application discloses a polysilicon slag slurry harmless treatment system, the polysilicon slag slurry harmless treatment system comprises a filtering device, a storage device and a mixing devicewhich are sequentially communicated through pipelines; the filtering device is used for filtering slag slurry containing silicon powder generated in the polysilicon production process to generate filter residue; the storage device is used for collecting the filter residue generated by the filtering device and obtaining the quality of the filter residue through a weighing module; the mixing deviceis used for processing the filter residue to generate brick-making raw materials when the quality of the filter residue in the storage device is greater than or equal to a preset quality threshold. Byadopting the system, polycrystalline silicon slag slurry can be subjected to harmless treatment, and the polysilicon slag slurry harmless treatment system is more environment-friendly and reduces energy consumption compared with the existing polycrystalline silicon slag slurry treatment system.

Description

technical field [0001] The application relates to the field of polysilicon production, and in particular to a harmless treatment system for polysilicon slurry. Background technique [0002] At present, the world's polysilicon production field mainly uses the Siemens method to produce polysilicon, and the process of producing polysilicon by the Siemens method will inevitably produce a large amount of waste residue, which needs to be treated. [0003] Domestically, evaporative drying or hydrolysis methods are mostly used to treat waste residues. However, evaporative drying methods consume a lot of energy, and hydrolysis methods are not environmentally friendly, and the processing load of subsequent sewage treatment devices is relatively large, and the operation and maintenance costs are relatively high. In addition, some of the waste residues are treated by drum filtration. However, the content of chlorosilane in the solid waste after drum filtration is still high. Due to the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C04B33/132C04B18/04C01B33/035C04B20/04C04B20/02
CPCC04B33/132C04B18/0481C04B20/023C04B20/04C04B20/02Y02W30/91Y02P40/60
Inventor 胡永吉葛冬松付治栋谢岩冯晓春吕亘亘王成
Owner 新疆戈恩斯能源科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap